Synthesis of nanostructured titanium nitride films by PLD through reactive processing

Surface Engineering

Volumn 25, Issue 3, 2009, Pages 218-222

  Krishnan, R ^a   Ramaseshan, R ^a   Mathews, T ^a   Nithya, R ^a   Dash, S ^a   Tyagi, A K ^a   Raj, Baldev ^a  

^a INDIRA GANDHI CENTRE FOR ATOMIC RESEARCH   (India)

Author keywords

Plasma assisted PLD; Reactive PLD; Thin films; TiN

Indexed keywords

AFM; ATOMIC FORCE MICROSCOPES; GLANCING INCIDENCE X-RAY DIFFRACTIONS; HIGH QUALITIES; LOW OXYGENS; METALLIC TARGETS; NANOSTRUCTURED TITANIUMS; NITROGEN GAS; NITROGEN PLASMAS; NITROGEN PRESSURES; PLASMA-ASSISTED PULSED LASER DEPOSITIONS; PULSED ND:YAG LASERS; REACTIVE PLD; REACTIVE PROCESSING; REACTIVE PULSED LASER DEPOSITIONS; RUTHERFORD BACK SCATTERINGS; TIN FILMS; TITANIUM TARGETS; X- RAY DIFFRACTIONS;

ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; AUGER ELECTRON SPECTROSCOPY; CRYSTALLITE SIZE; DIFFRACTION; LASERS; METALLIC FILMS; NEODYMIUM LASERS; NITROGEN; OXYGEN; PLASMA DEPOSITION; PLASMAS; PROGRAMMABLE LOGIC CONTROLLERS; PULSED LASER DEPOSITION; TARGETS; THIN FILMS; TIN; TITANIUM; X RAY DIFFRACTION;

TITANIUM NITRIDE;

EID: 63849260586     PISSN: 02670844     EISSN: None     Source Type: Journal    
DOI: 10.1179/174329407X265866     Document Type: Article

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