Selective ultrathin gold deposition by organometallic chemical vapor deposition onto organic self-assembled monolayers (SAMs)

Thin Solid Films

Volumn 340, Issue 1, 1999, Pages 274-279

  Wohlfart, Peter ^a   Wei, Jurij ^b   Käshammer, Josua ^a   Winter, Carl ^b   Scheumann, Volker ^a   Fischer, Roland A ^b   Mittler Neher, Silvia ^a  

^a MAX PLANCK INSTITUTE FOR POLYMER RESEARCH   (Germany)

^b RUHR UNIVERSITY BOCHUM   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; ATOMIC FORCE MICROSCOPY; DESORPTION; GOLD; MASS SPECTROMETRY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MONOLAYERS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SURFACE CHEMISTRY;

ATOMIC ABSORPTION SPECTROSCOPY; SELF ASSEMBLED MONOLAYERS; ULTRATHIN GOLD FILMS;

ULTRATHIN FILMS;

EID: 0345533981     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01366-2     Document Type: Article

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