Room-temperature chemical vapor deposition of aluminum and aluminum oxides on alkanethiolate self-assembled monolayers

Journal of Physical Chemistry C

Volumn 112, Issue 6, 2008, Pages 2091-2098

  Lu, Peng ^a   Demirkan, Korhan ^b   Opila, Robert L ^b   Walker, Amy V ^a  

^a WASHINGTON UNIVERSITY   (United States)

^b UNIVERSITY OF DELAWARE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM OXIDES; REACTION PATHWAYS;

ALUMINUM COMPOUNDS; ATOMIC LAYER DEPOSITION; SELF ASSEMBLED MONOLAYERS; SEMICONDUCTOR MATERIALS; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL VAPOR DEPOSITION;

EID: 40049111627     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp077100c     Document Type: Article

References (91)