Synthesis of fluorine doped zinc oxide by reactive magnetron sputtering

Acta Materialia

Volumn 59, Issue 20, 2011, Pages 7521-7529

  Noirfalise, X ^a   Godfroid, T ^b   Guisbiers, G ^c   Snyders, R ^a,b  

^a UNIVERSITY OF MONS   (Belgium)

^b MATERIA NOVA RESEARCH CENTER   (Belgium)

^c UNIVERSITÉ CATHOLIQUE DE LOUVAIN   (Belgium)

Author keywords

Electrical properties; Physical vapour deposition; Thin film coating; Transparent conductive oxide; Zinc oxide

Indexed keywords

CHARGE MOBILITIES; CRYSTALLINE PROPERTIES; DEPOSITED FILMS; ELECTRICAL AND OPTICAL PROPERTIES; ELECTRICAL RESISTIVITY; FLUORINE ATOMS; FLUORINE CONCENTRATIONS; FLUORINE CONTENT; FLUORINE-DOPED; FLUORINE-DOPED ZNO; GRAIN SIZE; HALL EFFECT MEASUREMENT; MATRIX; OPTIMAL SYNTHESIS; OXYGEN ATOM; PHYSICAL VAPOUR DEPOSITION; REACTIVE MAGNETRON SPUTTERING; THIN FILM COATING; TOTAL PRESSURE; TRANSPARENT CONDUCTIVE OXIDES; VISIBLE RANGE; XRD; ZNO; ZNO FILMS; ZNO STRUCTURES;

AMORPHOUS FILMS; ATOMIC SPECTROSCOPY; CRYSTALLITE SIZE; DC POWER TRANSMISSION; ELECTRIC CONDUCTIVITY; GRAIN BOUNDARIES; GRAIN SIZE AND SHAPE; HALL EFFECT; OPTICAL PROPERTIES; OPTIMIZATION; OXIDE FILMS; PHOTOELECTRON SPECTROSCOPY; THIN FILMS; VAPOR DEPOSITION; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC; ZINC OXIDE;

FLUORINE;

EID: 80053962332     PISSN: 13596454     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.actamat.2011.07.068     Document Type: Article

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