High-rate deposition of ZnO thin films by vacuum arc plasma evaporation

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 21, Issue 4, 2003, Pages 1404-1408

  Miyata, Toshihiro ^a   Ida, Satoshi ^a   Minami, Tadatsugu ^a  

^a KANAZAWA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL STRUCTURE; DECOMPOSITION; DEPOSITION; ELECTRIC VARIABLES MEASUREMENT; EVAPORATION; FILM PREPARATION; PLASMAS; TEMPERATURE; THIN FILMS; TRANSPARENCY; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

CRYSTALLINITY; HALL MOBILITY; OXIDE FRAGMENTS; VACUUM ARC PLASMA EVAPORATION; VAN DER PAUW METHOD;

ZINC OXIDE;

EID: 0042530466     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1580492     Document Type: Article

References (8)

1. T. Minami, Mater. Res. Bull. 25, 38 (2000).
2. N. Nakamura, H. Nakagawa, K. Koshida, and M. Niiya, Proceedings of the Fifth International Display Workshops (1998), p. 511.
3. T. Minami, S. Ida, and T. Miyata, Thin Solid Films 416, 92 (2002).
4. T. Oyama, N. Hashimoto, J. Shimizu, Y. Akao, H. Kojima, K. Aikawa, and K. Suzuki, J. Vac. Sci. Technol. A 10, 1682 (1992).
5. Y. Suzuki, F. Niino, and K. Katoh, J. Non-Cryst. Solids 218, 30 (1997).
6. H. Hirasawa, M. Yoshida, S. Nakumura, Y. Suzuki, S. Okada, and K. Kondo, Sol. Energy Mater. Sol. Cells 67, 231 (2001).
7. P. Souletie, S. Bethke, B. W. Wessels, and H. Pan, J. Cryst. Growth 86, 248 (1988).
8. J. Hu and R. G. Gordon, Sol. Cells 30, 437 (1991).