Transparent conducting ZnO thin films deposited by vacuum arc plasma evaporation

Thin Solid Films

Volumn 445, Issue 2, 2003, Pages 268-273

  Minami, Tadatsugu ^a   Ida, Satoshi ^a   Miyata, Toshihiro ^a   Minamino, Youhei ^a  

^a KANAZAWA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Co doping; Evaporation; In2O3; Multicomponent oxide; Thin film; Transparent conducting oxide; Vacuum arc plasma; ZnO

Indexed keywords

AMORPHOUS MATERIALS; CATHODES; COBALT; CONDUCTIVE FILMS; DEPOSITION; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY; EVAPORATION; PLASMA APPLICATIONS; TRANSPARENCY; VACUUM; ZINC OXIDE;

CO-DOPING; IN2O3; MULTICOMPONENT OXIDES; TRANSPARENT CONDUCTIVE OXIDES (TCO); VACUUM ARC PLASMAS;

THIN FILMS;

EID: 1642414909     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)01159-3     Document Type: Conference Paper

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