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Volumn 84, Issue 12, 2011, Pages

Effect of oxygen gas pressure on the kinetics of alumina film growth during the oxidation of Al(111) at room temperature

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EID: 80053906727     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.84.125445     Document Type: Article
Times cited : (58)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.