The effect of substrate orientation on the kinetics of ultra-thin oxide-film growth on Al single crystals

Acta Materialia

Volumn 56, Issue 12, 2008, Pages 2897-2907

  Reichel, F ^a   Jeurgens, L P H ^a   Mittemeijer, E J ^a  

^a MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

Author keywords

Crystallization; Ellipsometry; Ionic diffusion; Modeling; Oxide film growth kinetics

Indexed keywords

ALUMINUM COMPOUNDS; ELLIPSOMETRY; OXIDE FILMS; SINGLE CRYSTALS; ULTRATHIN FILMS;

RATE LIMITING STEP; SUBSTRATE ORIENTATION; ULTRA-THIN OXIDE FILMS;

FILM GROWTH;

EID: 44649158191     PISSN: 13596454     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.actamat.2008.02.031     Document Type: Article

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