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Physical Review Letters

Volumn 107, Issue 3, 2011, Pages

Tuning the limiting thickness of a thin oxide layer on Al(111) with oxygen gas pressure

(4) Cai, Na a Zhou, Guangwen a Müller, Kathrin b Starr, David E b

a State University of New York (United States)

b BROOKHAVEN NATIONAL LABORATORY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM OXIDE FILMS; GAS PRESSURES; OXYGEN ANION; OXYGEN GAS PRESSURE; OXYGEN IONS; OXYGEN PRESSURE; PRESSURE DEPENDENCE; ROOM TEMPERATURE; SATURATED SURFACES; THIN OXIDE LAYERS; X-RAY PHOTOELECTRON SPECTROSCOPY STUDIES;

KINETICS; LEAD OXIDE; OXIDE FILMS; PHOTOELECTRON SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

OXYGEN;

EID: 79961068482 PISSN: 00319007 EISSN: 10797114 Source Type: Journal
DOI: 10.1103/PhysRevLett.107.035502 Document Type: Article

Times cited : (61)

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