Materials Science: Structure of the ultrathin aluminum oxide film on NiAl(110)

Science

Volumn 308, Issue 5727, 2005, Pages 1440-1442

  Kresse, Georg ^a   Schmid, Michael ^b   Napetschnig, Evelyn ^b   Shishkin, Maxim ^a   Köhler, Lukas ^a   Varga, Peter ^b  

^a UNIVERSITY OF VIENNA   (Austria)

^b VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; MATHEMATICAL MODELS; OXIDATION; SCANNING TUNNELING MICROSCOPY; STOICHIOMETRY; ULTRATHIN FILMS;

AB INITIO MODELING; BUILDING BLOCKS; METAL SURFACE OXIDE; WIDE-GAP INSULATORS;

MATERIALS SCIENCE;

ALUMINUM DERIVATIVE; ALUMINUM OXIDE; NICKEL COMPLEX;

ALUMINUM OXIDE;

AB INITIO CALCULATION; ARTICLE; CHEMICAL ANALYSIS; CHEMICAL STRUCTURE; FILM; MATERIALS; MATERIALS TESTING; PRIORITY JOURNAL; SCANNING TUNNELING MICROSCOPY; STOICHIOMETRY; STRUCTURE ANALYSIS;

EID: 20444392081     PISSN: 00368075     EISSN: None     Source Type: Journal    
DOI: 10.1126/science.1107783     Document Type: Article

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27. We thank H.-J. Freund for helpful discussions and for lending an NiAl single crystal to us. This work was supported by the Austrian Fonds zur Förderung der wissenschaftlichen Forschung.