Role of positive ions in determining the deposition rate and film chemistry of continuous wave hexamethyl disiloxane plasmas

Langmuir

Volumn 27, Issue 19, 2011, Pages 11943-11950

  Michelmore, Andrew ^a   Bryant, Paul M ^b   Steele, David A ^a   Vasilev, Krasimir ^a   Bradley, James W ^b   Short, Robert D ^a  

^a UNIVERSITY OF SOUTH AUSTRALIA   (Australia)

^b UNIVERSITY OF LIVERPOOL   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CONTINUOUS WAVE; FILM CHEMISTRY; FLUENCES; FUNCTION OF PRESSURE; HEXAMETHYL DISILOXANE; ION FLUXES; ION MASS SPECTROMETRY; ION REACTIONS; IONIC SPECIES; LOW POWER; LOW PRESSURE PLASMA; MASS DEPOSITION RATE; PLASMA POLYMERS; RF-POWER;

CHEMICAL ANALYSIS; DEPOSITION RATES; DEPOSITS; OLIGOMERIZATION; OLIGOMERS; PLASMAS; POLYMERS; POSITIVE IONS; SECONDARY ION MASS SPECTROMETRY; SPECTROMETRY; SURFACE REACTIONS; X RAY PHOTOELECTRON SPECTROSCOPY;

FILM GROWTH;

HEXAMETHYLDISILOXANE; ION; SILOXANE;

ARTICLE; ARTIFICIAL MEMBRANE; CHEMICAL STRUCTURE; CHEMISTRY; MASS SPECTROMETRY; SPECTROPHOTOMETRY; X RAY;

IONS; MASS SPECTROMETRY; MEMBRANES, ARTIFICIAL; MOLECULAR STRUCTURE; SILOXANES; SPECTROMETRY, MASS, SECONDARY ION; SPECTROPHOTOMETRY; X-RAYS;

EID: 80053314852     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la202010n     Document Type: Article

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