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Volumn 382, Issue 1-2, 2001, Pages 1-3
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Studies of the earliest stages of plasma-enhanced chemical vapor deposition of SiO2 on polymeric substrates
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Author keywords
[No Author keywords available]
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Indexed keywords
FILM GROWTH;
OXYGEN;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
POLYETHYLENE TEREPHTHALATES;
POLYIMIDES;
POLYPROPYLENES;
REACTIVE ION ETCHING;
RUTHERFORD BACKSCATTERING SPECTROSCOPY;
SILICA;
X RAY PHOTOELECTRON SPECTROSCOPY;
FRANK-VAN DER MERWE METHOD;
INORGANIC COATINGS;
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EID: 0034823478
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/S0040-6090(00)01781-8 Document Type: Article |
Times cited : (38)
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References (11)
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