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Volumn 382, Issue 1-2, 2001, Pages 1-3

Studies of the earliest stages of plasma-enhanced chemical vapor deposition of SiO2 on polymeric substrates

Author keywords

[No Author keywords available]

Indexed keywords

FILM GROWTH; OXYGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYETHYLENE TEREPHTHALATES; POLYIMIDES; POLYPROPYLENES; REACTIVE ION ETCHING; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICA; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0034823478     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01781-8     Document Type: Article
Times cited : (38)

References (11)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.