Morphology and patterning processes of thin organosilicon and perfluorinated bi-layer plasma polymer films

Plasma Processes and Polymers

Volumn 3, Issue 1, 2006, Pages 39-47

  Wang, Xuemei ^a   Grundmeier, Guido ^a  

^a MAX PLANCK INSTITUT FÜR EISENFORSCHUNG GMBH   (Germany)

Author keywords

Bi layer films; Buckling; Morphology; Patterning; Plasma polymer

Indexed keywords

ATOMIC FORCE MICROSCOPY; COMPRESSIVE STRESS; ELLIPSOMETRY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MONOMERS; MORPHOLOGY; MULTILAYERS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA POLYMERIZATION; SILICON COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

BI-LAYER PLASMA POLYMER FILMS; HEPTADECAFLUORODECENE (HDFD); HEXAMETHYLDISILOXANE (HMDSO); ORGANOSILICON;

PLASTIC FILMS;

EID: 31444437531     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200500063     Document Type: Article

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