Plasma processing approach to molecular surface tailoring of nanoparticles: Improved photocatalytic activity of TiO 2

Chemistry of Materials

Volumn 18, Issue 13, 2006, Pages 2989-2996

  Cho, Jai ^a   Denes, Ferencz S ^b   Timmons, Richard B ^a  

^a UNIVERSITY OF TEXAS AT ARLINGTON   (United States)

^b University of Wisconsin Madison   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARBONACEOUS MATERIALS; PLASMA INDUCED FILM DEPOSITION; ROTATING REACTORS; TETRAMETHYLTIN (TMT) MONOMERS;

ANNEALING; ATOMIC FORCE MICROSCOPY; COATED MATERIALS; NANOSTRUCTURED MATERIALS; PHOTOCATALYSIS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA POLYMERIZATION; THIN FILMS; TIN;

TITANIUM DIOXIDE;

EID: 33746354601     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm060212g     Document Type: Article

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