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Microelectronic Engineering

Volumn 88, Issue 10, 2011, Pages 3070-3074

Sub-5 keV electron-beam lithography in hydrogen silsesquioxane resist

(6) Manfrinato, Vitor R a Cheong, Lin Lee a Duan, Huigao a Winston, Donald a Smith, Henry I a Berggren, Karl K a

a MASSACHUSETTS INSTITUTE OF TECHNOLOGY (United States)

Author keywords

High resolution; Hydrogen silsesquioxane; Low energy electron beam lithography; Low voltage electron beam lithography; Proximity effect

Indexed keywords

HIGH RESOLUTION; HYDROGEN SILSESQUIOXANE; LOW ENERGIES; LOW-VOLTAGE; PROXIMITY EFFECTS;

ELECTRONS; HYDROGEN;

ELECTRON BEAM LITHOGRAPHY;

EID: 80052806927 PISSN: 01679317 EISSN: None Source Type: Journal
DOI: 10.1016/j.mee.2011.05.024 Document Type: Article

Times cited : (20)

References (23)

1
- 0029770960
- D.R.S. Cumming, S. Thoms, J.M.R. Weaver, and S.P. Beaumont Microelectron. Eng. 30 1996 423
- (1996) Microelectron. Eng. , vol.30 , pp. 423
- Cumming, D.R.S.¹ Thoms, S.² Weaver, J.M.R.³ Beaumont, S.P.⁴

2
- 34247584095
- A.E. Grigorescu, M.C. van der Krogt, C.W. Hagen, and P. Kruit Microelectron. Eng. 84 2007 822
- (2007) Microelectron. Eng. , vol.84 , pp. 822
- Grigorescu, A.E.¹ Van Der Krogt, M.C.² Hagen, C.W.³ Kruit, P.⁴

3
- 72849138014
- Joel K.W. Yang, Bryan Cord, Huigao Duan, Karl K. Berggren, Joseph Klingfus, Sung-Wook Nam, Ki-Bum Kim, and Michael J. Rooks J. Vac. Sci. Technol., B 27 2009 2622
- (2009) J. Vac. Sci. Technol., B , vol.27 , pp. 2622
- Yang, J.K.W.¹ Cord, B.² Duan, H.³ Berggren, K.K.⁴ Klingfus, J.⁵ Nam, S.-W.⁶ Kim, K.-B.⁷ Rooks, M.J.⁸

4
- 72849143619
- Bryan Cord, Joel Yang, Huigao Duan, David C. Joy, Joseph Klingfus, and Karl K. Berggren J. Vac. Sci. Technol., B 27 2009 2616
- (2009) J. Vac. Sci. Technol., B , vol.27 , pp. 2616
- Cord, B.¹ Yang, J.² Duan, H.³ Joy, D.C.⁴ Klingfus, J.⁵ Berggren, K.K.⁶

5
- 0000180641
- Y.-H. Lee, R. Browning, N. Maluf, G. Owen, and R.F.W. Pease J. Vac. Sci. Technol., B 10 1992 3094
- (1992) J. Vac. Sci. Technol., B , vol.10 , pp. 3094
- Lee, Y.-H.¹ Browning, R.² Maluf, N.³ Owen, G.⁴ Pease, R.F.W.⁵

6
- 22644449772
- A. Tilke, M. Vogel, F. Simmel, A. Kriele, R.H. Blick, H. Lorenz, D.A. Wharam, and J.P. Kotthaus J. Vac. Sci. Technol., B 17 1999 1594
- (1999) J. Vac. Sci. Technol., B , vol.17 , pp. 1594
- Tilke, A.¹ Vogel, M.² Simmel, F.³ Kriele, A.⁴ Blick, R.H.⁵ Lorenz, H.⁶ Wharam, D.A.⁷ Kotthaus, J.P.⁸

7
- 78650092761
- D. Rio, C. Constancias, M. Martin, B. Icard, J. van Nieuwstadt, J. Vijverberg, and L. Pain J. Vac. Sci. Technol., B 28 2010 C6 C14
- (2010) J. Vac. Sci. Technol., B , vol.28
- Rio, D.¹ Constancias, C.² Martin, M.³ Icard, B.⁴ Van Nieuwstadt, J.⁵ Vijverberg, J.⁶ Pain, L.⁷

8
- 33845247577
- L.P. Muray, C.S. Silver, and J.P. Spallas J. Vac. Sci. Technol., B 24 6 2006 2945
- (2006) J. Vac. Sci. Technol., B , vol.24 , Issue.6 , pp. 2945
- Muray, L.P.¹ Silver, C.S.² Spallas, J.P.³

9
- 80052798008
- 2009
- J.H. Jack, S.J. Chen, T.Y. Lin, S.M. Fang, Faruk Krecinic Chang, Bum J. Lin, 2009 International symposium on VLSI-TSA, 2009, pp. 96-97.
- (2009) International Symposium on VLSI-TSA , pp. 96-97
- Jack, J.H.¹ Chen, S.J.² Lin, T.Y.³ Fang, S.M.⁴ Krecinic Chang, F.⁵ Lin, B.J.⁶

10
- 22644449818
- A. Olkhovets, and H.G. Craighead J. Vac. Sci. Technol., B 17 1999 1366
- (1999) J. Vac. Sci. Technol., B , vol.17 , pp. 1366
- Olkhovets, A.¹ Craighead, H.G.²

11
- 0001654730
- M.J. Lercel, H.G. Craighead, A.N. Parikh, K. Seshadri, and D.L. Allara Appl. Phys. Lett. 68 1996 1504
- (1996) Appl. Phys. Lett. , vol.68 , pp. 1504
- Lercel, M.J.¹ Craighead, H.G.² Parikh, A.N.³ Seshadri, K.⁴ Allara, D.L.⁵

12
- 0034205477
- M. Peuker Microelectron. Eng. 53 2000 337
- (2000) Microelectron. Eng. , vol.53 , pp. 337
- Peuker, M.¹

13
- 76949106650
- M.A. Mohammad, T. Fito, J. Chen, S. Buswell, M. Aktary, M. Stepanova, and S.K. Dew Microelectron. Eng. 87 2010 1104
- (2010) Microelectron. Eng. , vol.87 , pp. 1104
- Mohammad, M.A.¹ Fito, T.² Chen, J.³ Buswell, S.⁴ Aktary, M.⁵ Stepanova, M.⁶ Dew, S.K.⁷

14
- 0036030737
- A. Jamieson, C.G. Willson, Y. Hsu, and A. Brodie Proc. SPIE 4690 2002 1171
- (2002) Proc. SPIE , vol.4690 , pp. 1171
- Jamieson, A.¹ Willson, C.G.² Hsu, Y.³ Brodie, A.⁴

15
- 37149004252
- J.K.W. Yang, and K.K. Berggren J. Vac. Sci. Technol., B 25 2007 2025
- (2007) J. Vac. Sci. Technol., B , vol.25 , pp. 2025
- Yang, J.K.W.¹ Berggren, K.K.²

16
- 84984051858
- D.C. Joy, and S. Luo Scanning 11 1989 176
- (1989) Scanning , vol.11 , pp. 176
- Joy, D.C.¹ Luo, S.²

17
- 80052799795
- Ph.D. Thesis, MIT
- R.A. Ghanbari, Ph.D. Thesis, MIT, 1993. .
- (1993)
- Ghanbari, R.A.¹

18
- 0022593979
- Henry I. Smith J. Vac. Sci. Technol., B 4 1986 148
- (1986) J. Vac. Sci. Technol., B , vol.4 , pp. 148
- Smith, H.I.¹

19
- 33645385648
- R. Menon, D. Gil, and H.I. Smith J. Opt. Soc. Am. A 23 2006 567
- (2006) J. Opt. Soc. Am. A , vol.23 , pp. 567
- Menon, R.¹ Gil, D.² Smith, H.I.³

20
- 80052790518
- L. Battistella, D. Winston, J. Ferrera, M. Mondol, and Karl K. Berggren Personal Communication 2010
- (2010) Personal Communication
- Battistella, L.¹ Winston, D.² Ferrera, J.³ Mondol, M.⁴ Berggren, K.K.⁵

21
- 78650141490
- H. Duan, V.R. Manfrinato, J.K.W. Yang, D. Winston, B.M. Cord, and K.K. Berggren J. Vac. Sci. Technol., B 28 2010 C6 H11
- (2010) J. Vac. Sci. Technol., B , vol.28
- Duan, H.¹ Manfrinato, V.R.² Yang, J.K.W.³ Winston, D.⁴ Cord, B.M.⁵ Berggren, K.K.⁶

22
- 0016572881
- T.H.P. Chang J. Vac. Sci. Technol. 12 1975 1271
- (1975) J. Vac. Sci. Technol. , vol.12 , pp. 1271
- Chang, T.H.P.¹

23
- 80052815557
- Thesis (S.M.), MIT
- L.L. Cheong, Thesis (S.M.), MIT, 2010. .
- (2010)
- Cheong, L.L.¹

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