Limiting factors in sub- 10 nm scanning-electron-beam lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 27, Issue 6, 2009, Pages 2616-2621

  Cord, Bryan ^a   Yang, Joel ^a   Duan, Huigao ^a   Joy, David C ^b   Klingfus, Joseph ^c   Berggren, Karl K ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^b OAK RIDGE NATIONAL LABORATORY   (United States)

^c Raith USA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BEAM SCATTERING; CURRENT GENERATION; DENSE STRUCTURES; FEATURE SIZES; LIMITING FACTORS; RESOLUTION LIMITS; SCANNING ELECTRON-BEAM LITHOGRAPHIES; SECONDARY ELECTRONS; SPOT SIZES; URGENT PROBLEMS;

ELECTRON BEAM LITHOGRAPHY;

EID: 72849143619     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3253603     Document Type: Conference Paper

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