메뉴 건너뛰기




Volumn 21, Issue 37, 2011, Pages 14150-14155

Principles of voxel refinement in optical direct write lithography

Author keywords

[No Author keywords available]

Indexed keywords

ARBITRARY PATTERNS; MULTI-BEAM; NANOSCALE RESOLUTIONS; OPTICAL DIRECT WRITE; OUT-OF-FOCUS; SCALING BEHAVIOR; TWO PHOTON;

EID: 80052527265     PISSN: 09599428     EISSN: 13645501     Source Type: Journal    
DOI: 10.1039/c1jm11915j     Document Type: Article
Times cited : (17)

References (39)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.