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Volumn 21, Issue 37, 2011, Pages 14150-14155
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Principles of voxel refinement in optical direct write lithography
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Author keywords
[No Author keywords available]
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Indexed keywords
ARBITRARY PATTERNS;
MULTI-BEAM;
NANOSCALE RESOLUTIONS;
OPTICAL DIRECT WRITE;
OUT-OF-FOCUS;
SCALING BEHAVIOR;
TWO PHOTON;
GELATION;
COAGULATION;
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EID: 80052527265
PISSN: 09599428
EISSN: 13645501
Source Type: Journal
DOI: 10.1039/c1jm11915j Document Type: Article |
Times cited : (17)
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References (39)
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