Two-photon lithography of sub-wavelength metallic structures in a polymer matrix

Advanced Materials

Volumn 22, Issue 33, 2010, Pages 3695-3699

  Shukla, Shobha ^b   Furlani, Edward P ^b   Vidal, Xavier ^b   Swihart, Mark T ^b   Prasad, Paras N ^a  

^a STATE UNIVERSITY OF NEW YORK   (United States)

^b the State University of New York   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANALYTICAL MODEL; CHIRAL ELEMENTS; ELECTROMAGNETIC RESPONSE; FUNCTIONAL GRATINGS; GOLD NANOPARTICLES; LASER INTENSITIES; METAL SALT; METALLIC NANOSTRUCTURE; METALLIC STRUCTURES; NEGATIVE PHOTORESISTS; NOVEL METHODS; SUB-WAVELENGTH; SUBWAVELENGTH RESOLUTION; TWO PHOTON; TWO-PHOTON LITHOGRAPHY;

MATHEMATICAL MODELS; PHOTONS; PHOTORESISTS;

OPTICAL PROPERTIES;

GOLD; METAL NANOPARTICLE; NANOMATERIAL; POLYMER;

ARTICLE; CHEMISTRY; METHODOLOGY; NANOTECHNOLOGY; PHOTON; ULTRASTRUCTURE;

GOLD; METAL NANOPARTICLES; NANOSTRUCTURES; NANOTECHNOLOGY; PHOTONS; POLYMERS;

EID: 77956356698     PISSN: 09359648     EISSN: 15214095     Source Type: Journal    
DOI: 10.1002/adma.201000059     Document Type: Article

References (29)

1. K. S. Lee, R. H. Kim, D. Y. Yang, S. H. Park, Prog. Poly. Sci. 2008, 33, 631.
2. C. N. LaFratta, J. T. Fourkas, T. Baldacchini, R. A. Farrer, Angew. Chem. Int. Ed. 2007, 46, 6238.
3. R. R. Gattass, E. Mazur, Nat. Photonics 2008, 2, 219.
4. T. Nakahama, S. Yokoyama, H. Miki, S. Mashiko, Thin Solid Films 2006, 499, 406.
5. P. N. Prasad, Nanophotonics, John Wiley & Sons, Hoboken, 2004.
6. H. E. Pudavar, M. P. Joshi, P. N. Prasad, B. A. Reinhardt, Appl. Phys. Lett. 1999, 74, 1338.
7. Y. Shen, J. Swiatkiewicz, D. Jakubczyk, F. Xu, P. N. Prasad, R. A. Vaia, B. A. Reinhardt, Appl. Opt. 2001, 40, 938.
8. P. P. Markowicz, H. Tiryaki, H. Pudavar, P. N. Prasad, N. N. Lepeshkin, R. W. Boyd, Phys. Rev. Lett. 2004, 92, 083903.
9. R. Guo, Z. Li, Z. Jiang, D. Yuan, W. Huang, A. Xia, J. Opt. A: Pure Appl. Opt. 2005, 7, 396.
10. T. Baldacchini, A. C. Pons, J. Pons, C. LaFratta, J. Fourkas, Y. Sun, M. Naughton, Opt. Exp. 2005, 13, 1275.
11. S. Jiguet, A. Bertsch, H. Hofmann, P. Renaud, Adv. Funct. Mater. 2005, 15, 1511.
12. Y.-Y. Cao, X.-Z. Dong, N. Takeyasu, T. Tanaka, Z.-S. Zhao, X.-M. Duan, S. Kawata, Appl. Phys. A: Mater. Sci. Process. 2009, 96, 453.
13. S. Maruo, T. Saeki, Opt. Exp. 2008, 16, 1174.
14. L. Vurth, P. Baldeck, O. Stephan, G. Vitrant, Appl. Phys. Lett. 2008, 92, 171103.
15. J. Henzie, M. H. Lee, T. W. Odom, Nat. Nanotechnol. 2007, 2, 549.
16. M. S. Rill, C. Plet, M. Thiel, I. Staude, G. von Freymann, S. Linden, M. Wegener, Nat. Mater. 2008, 7, 543.
17. M. C. P. Wang, B. D. Gates, Mater. Today 2009, 12, 34.
18. S. Nam, X. Jiang, Q. Xiong, D. Ham, C. M. Lieber, Proc. Natl. Acad. Sci. USA 2009, 106, 21035.
19. A. Bratkovsky, E. Ponizovskaya, S. Y. Wang, P. Holmstrom, L. Thylen, Y. Fu, H. Agren, Appl. Phys. Lett. 2008, 93, 193106.
20. H. C. Chiamori, J. W. Brown, E. V. Adhiprakasha, E. T. Hantsoo, J. B. Straalsund, N. A. Melosh, B. L. Pruitt, Microelectron. J. 2008, 39, 228.
21. M. Bellec, A. Royon, B. Bousquet, K. Bourhis, M. Treguer, T. Cardinal, M. Richardson, L. Canioni, Opt. Exp. 2009, 17, 10304.
22. T. Tanaka, A. Ishikawa, S. Kawata, Appl. Phys. Lett. 2006, 88, 081107.
23. R. Acosta Ortiz, M. d. L. G. Cisneros, G. A. García, Polymer 2005, 46, 10663.
24. S. Kubo, A. Diaz, Y. Tang, T. S. Mayer, I. C. Khoo, T. E. Mallouk, Nano Lett. 2007, 7, 3418.
25. K. Kaneko, H.-B. Sun, X.-M. Duan, S. Kawata, Appl. Phys. Lett. 2003, 83, 1426.
26. S. Eustis, M. A. El Sayed, J. Phys. Chem. B 2006, 110, 14014.
27. B. Bai, Y. Svirko, J. Turunen, T. Vallius, Phys. Rev. A 2007, 76, 023811.
28. Y. Shen, J. Swiatkiewicz, P. N. Prasad, R. A. Vaia, Opt. Comm. 2001, 200, 9.
29. K. K. Seet, S. Juodkazis, V. Jarutis, H. Misawa, Appl. Phys. Lett. 2006, 89, 024106.