Improvement of spatial resolution in nano-stereolithography using radical quencher

Macromolecular Research

Volumn 14, Issue 5, 2006, Pages 559-564

  Sang, Hu Park ^a   Tae, Woo Lim ^a   Yang, Dong Yol ^a   Ran, Hee Kim ^b   Lee, Kwang Sup ^b  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Hannam University   (South Korea)

Author keywords

Radical quencher; Three dimensional microstructures; Two photon polymerization

Indexed keywords

EID: 33750915982     PISSN: 15985032     EISSN: None     Source Type: Journal    
DOI: 10.1007/bf03218724     Document Type: Article

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