Structural dependence of grain boundary resistivity in copper nanowires

Japanese Journal of Applied Physics

Volumn 50, Issue 8 PART 4, 2011, Pages

  Kim, Tae Hwan ^a,b   Nicholson, Don M ^a   Zhang, X G ^a   Evans, Boyd M ^a   Kulkarni, Nagraj S ^a   Kenik, Edward A ^a   Meyer, Harry M ^a   Radhakrishnan, Balasubramaniam ^a   Li, An Ping ^a  

^a OAK RIDGE NATIONAL LABORATORY   (United States)

^b Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

COINCIDENCE BOUNDARIES; COPPER NANOWIRES; DIRECT MEASUREMENT; FIRST-PRINCIPLES; FOUR-PROBE; GRAIN BOUNDARY RESISTIVITY; HIGH SYMMETRY; IMPURITY DISTRIBUTION; INDIVIDUAL GRAIN BOUNDARIES; INTER-GRAIN; ORDERS OF MAGNITUDE; RESISTANCE CHANGE; SCANNING TUNNELING MICROSCOPES; STRUCTURAL DEPENDENCE;

GRAIN BOUNDARIES; GRAIN SIZE AND SHAPE; IMPURITIES;

NANOWIRES;

EID: 80052012275     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.50.08LB09     Document Type: Conference Paper

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