Dependence of resistivity on surface profile in nanoscale metal films and wires

Journal of Applied Physics

Volumn 103, Issue 11, 2008, Pages

  Feldman, Baruch ^a   Deng, Rui ^a   Dunham, Scott T ^a  

^a UNIVERSITY OF WASHINGTON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

(1 1 0) SURFACE; (P ,P ,T) MEASUREMENTS; AMERICAN INSTITUTE OF PHYSICS (AIP); ARBITRARY SURFACES; BULK RESISTIVITIES; CU(TI) FILM; INDIVIDUAL (PSS 544-7); METAL FILMS; NANO SCALING; NANOWIRE SURFACES; QUANTUM MODELING; ROOT MEAN SQUARE ROUGHNESS (RMS); SHORT WAVELENGTH (SW); SPECULAR SCATTERING; SURFACE PROFILING;

COPPER; CURVE FITTING; ELECTRIC WIRE; FRICTION; METALLIC FILMS; PHOTORESISTS; SCATTERING; SPECTROSCOPIC ANALYSIS; STEEL ANALYSIS; SULFATE MINERALS; SURFACE PROPERTIES; SURFACE ROUGHNESS;

SURFACES;

EID: 45149104322     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2937085     Document Type: Article

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