Resistivity of thin Cu films with surface roughness

Physical Review B - Condensed Matter and Materials Physics

Volumn 79, Issue 15, 2009, Pages

  Ke, Youqi ^a   Zahid, Ferdows ^a   Timoshevskii, V ^a   Xia, Ke ^b   Gall, D ^c   Guo, Hong ^a  

^a MCGILL UNIVERSITY   (Canada)

^b BEIJING NORMAL UNIVERSITY   (China)

^c RENSSELAER POLYTECHNIC INSTITUTE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 65149093187     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.79.155406     Document Type: Article

References (32)

1. International Technology Roadmap for Semiconductors on Interconnect, 2007: www.itrs.net
2. S. M. Rossnagel and T. S. Kuan, J. Vac. Sci. Technol. B 22, 240 (2004). 10.1116/1.1642639
3. T. S. Kuan, C. K. Inoki, G. S. Oehrlein, K. Rosse, Y.-P. Zhao, G.-C. Wang, S. M. Rossnagel, and C. Cabral, in Materials, Technology, and Reliability for Advanced Interconnects and Low-k Dielectrics, MRS Symposia Proceedings No. 612 (Materials Research Society, Pittsburgh, 2000), p. D7.1.1.
4. J. J. Plombon, E. Andideh, V. M. Bubin, and J. Maiz, Appl. Phys. Lett. 89, 113124 (2006). 10.1063/1.2355435 (Pubitemid 44396642)
5. M. Aouadi, P. K. Shreeman, and M. Williams, J. Appl. Phys. 96, 3949 (2004). 10.1063/1.1784621
6. N. W. Ashcroft and N. D. Mermin, Solid State Physics (Saunders College, Philadelphia, 1976), pp. 52 and 323- 324.
7. J. M. Purswani and D. Gall, Thin Solid Films 516, 465 (2007). 10.1016/j.tsf.2007.07.146 (Pubitemid 350102601)
8. H.-D. Liu, Y.-P. Zhao, G. Ramanath, S. P. Murarka, and G.-C. Wang, Thin Solid Films 384, 151 (2001). 10.1016/S0040-6090(00)01818-6
9. V. Barnat, D. Nagakura, P.-I. Wang, and T.-M. Lu, J. Appl. Phys. 91, 1667 (2002). 10.1063/1.1430530 (Pubitemid 34148850)
10. K. Fuchs, Proc. Cambridge Philos. Soc. 34, 100 (1938). 10.1017/S0305004100019952
11. E. H. Sondheimer, Adv. Phys. 1, 1 (1952). 10.1080/00018735200101151
12. M. S. P. Lucas, J. Appl. Phys. 36, 1632 (1965). 10.1063/1.1703100
13. A. F. Mayadas and M. Shatzkes, Phys. Rev. B 1, 1382 (1970). 10.1103/PhysRevB.1.1382
14. Y. Namba, Jpn. J. Appl. Phys. 9, 1326 (1970). 10.1143/JJAP.9.1326
15. H. Hoffmann and J. Vancea, Thin Solid Films 85, 147 (1981). 10.1016/0040-6090(81)90627-1 (Pubitemid 12524838)
16. X.-G. Zhang and W. H. Butler, Phys. Rev. B 51, 10085 (1995). 10.1103/PhysRevB.51.10085
17. Nandini Trivedi and N. W. Ashcroft, Phys. Rev. B 38, 12298 (1988). 10.1103/PhysRevB.38.12298
18. Guy Fishman and Daniel Calecki, Phys. Rev. B 43, 11581 (1991). 10.1103/PhysRevB.43.11581
19. G. Palasantzas and J. Barnas, Phys. Rev. B 56, 7726 (1997). 10.1103/PhysRevB.56.7726
20. A. E. Meyerovich and I. V. Ponomarev, Phys. Rev. B 65, 155413 (2002). 10.1103/PhysRevB.65.155413
21. V. Timoshevskii, Y. Ke, H. Guo, and D. Gall, J. Appl. Phys. 103, 113705 (2008). 10.1063/1.2937188
22. Y. Zhou, S. Sreekala, P. M. Ajayan, and S. K. Nayak, J. Phys.: Condens. Matter 20, 095209 (2008). 10.1088/0953-8984/20/9/095209
23. Y. Ke, K. Xia, and H. Guo, Phys. Rev. Lett. 100, 166805 (2008). 10.1103/PhysRevLett.100.166805
24. N. Zhu, H. Guo, and R. Harris, Phys. Rev. Lett. 77, 1825 (1996). 10.1103/PhysRevLett.77.1825
25. W. Ren, Z. Qiao, J. Wang, Q. Sun, and H. Guo, Phys. Rev. Lett. 97, 066603 (2006). 10.1103/PhysRevLett.97.066603 (Pubitemid 44223144)
26. G. D. Mahan, Many-Particle Physics (Plenum, New York, 1981).
27. See EPAPS Document No. E-PRLTAO-100-020817 for supplemental material. For more information on EPAPS, see http://www.aip.org/pubservs/epaps.html
28. I. Turek, V. Drchal, J. Kudronovsky, M. Sob, and P. Weinberger, Electronic Structure of Disordered Alloys, Surfaces and Interfaces (Kluwer Academic, Boston, 1997).
29. B. Velicky, Phys. Rev. 184, 614 (1969). 10.1103/PhysRev.184.614
30. J. Taylor, H. Guo, and J. Wang, Phys. Rev. B 63, 245407 (2001) 10.1103/PhysRevB.63.245407
31. J. Taylor, H. Guo, and J. Wang, Phys. Rev. B 63, 121104 (2001). 10.1103/PhysRevB.63.121104
32. S. Datta, Electronic Transport in Mesoscopic Systems (Cambridge University Press, Cambridge, UK, 1997).