Automatic data quality evaluation for the AVM system

IEEE Transactions on Semiconductor Manufacturing

Volumn 24, Issue 3, 2011, Pages 445-454

  Huang, Yi Ting ^a   Cheng, Fan Tien ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

Automatic data quality evaluation; automatic virtual metrology (AVM); metrology data quality index (DQIy); process data quality index (DQIX)

Indexed keywords

ABNORMAL DATA; ADAPTIVE RESONANCE THEORY; AUTOMATIC DATA QUALITY EVALUATION; AUTOMATIC VIRTUAL METROLOGY SYSTEMS; DATA FEATURE; DATA QUALITY; DISPLAY INDUSTRY; EUCLIDEAN DISTANCE; METROLOGY DATA; METROLOGY DATA QUALITY INDEX (DQIY); MODEL TRAINING; PRINCIPAL COMPONENTS; PROCESS DATA; VIRTUAL METROLOGY;

DATA REDUCTION; FACE RECOGNITION; LIQUID CRYSTAL DISPLAYS; MEASUREMENTS; ONLINE SYSTEMS; PRINCIPAL COMPONENT ANALYSIS; QUALITY ASSURANCE; REAL TIME SYSTEMS; THIN FILM DEVICES; THIN FILM TRANSISTORS; UNITS OF MEASUREMENT;

QUALITY CONTROL;

EID: 80051553999     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/TSM.2011.2154910     Document Type: Article

References (29)

1. A. Weber, "Virtual metrology and your technology watch list: Ten things you should know about this emerging technology," Future Fab Int., vol. 22, no. 4, pp. 52-54, Jan. 2007.
2. F.-T. Cheng, H.-C. Huang, and C.-A. Kao, "Dual-phase virtual metrology scheme," IEEE Trans. Semicond. Manuf., vol. 20, no. 4, pp. 566-571, Nov. 2007.
3. F.-T. Cheng, Y.-T. Chen, Y.-C. Su, and D.-L. Zeng, "Evaluating reliance level of a virtual metrology system," IEEE Trans. Semicond. Manuf., vol. 21, no. 1, pp. 92-103, Feb. 2008.
4. Y.-T. Huang, H.-C. Huang, F.-T. Cheng, T.-S. Liao, and F.-C. Chang, "Automatic virtual metrology system design and implementation," in Proc. IEEE Int. Conf. Automat. Sci. Eng., Aug. 2008, pp. 223-229.
5. G. Spitzlsperger, C. Schmidt, G. Ernst, H. Strasser, and M. Speil, "Fault detection for a via etch process using adaptive multivariate methods," IEEE Trans. Semicond. Manuf., vol. 18, no. 4, pp. 528-533, Nov. 2005. (Pubitemid 41750299)
6. C. J. Spanos, H. F. Guo, A. Miller, and J. Levine-Parrill, "Real-time statistical process control using tool data," IEEE Trans. Semicond. Manuf., vol. 5, no. 4, pp. 308-318, Nov. 1992. (Pubitemid 23594953)
7. R. R. Azencott, "A method for monitoring a system based on performance indicators," Miriad Technol., U.S. Patent US6594618, 2003.
8. J. Lacaille and M. Zagrebnov, "An unsupervised diagnosis for process tool fault detection: The flexible golden pattern," IEEE Trans. Semicond. Manuf., vol. 20, no. 4, pp. 355-363, Nov. 2007.
9. T. W. Anderson, "Asymptotic theory for principal component analysis," Ann. Math. Statist., vol. 34, no. 1, pp. 122-148, 1963.
10. K. A. Chamness, "Method and system of diagnosing a processing system using adaptive multivariate analysis," U.S. Patent US7328126, Tokyo Electro Limited, Tokyo, Japan, 2008.
11. J. Dattorro, Convex Optimization and Euclidean Distance Geometry. Palo Alto, CA: Meboo, 2005.
12. G. A. Carpenter and S. Grossberg, "ART 2: Self-organization of sable category recognition codes for analog input patterns," Appl. Opt., vol. 26, no. 12, pp. 4919-4930, Dec. 1987.
13. G. A. Carpenter and S. Grossberg, "A massively parallel architecture for a self-organizing neural pattern recognition machine," Comput. Vision Graphics Image Process., vol. 13, no. 7, pp. 37-54, Jul. 1987.
14. I. H. Witten and E. Frank, Data Mining: Practical Machine Learning Tools and Techniques. San Francisco, CA: Morgan Kaufman, 2005.
15. F.-T. Cheng, J. Y.-C. Chang, H.-C. Huang, C.-A. Kao, Y.-L. Chen, and J.-L. Peng, "Benefit model of virtual metrology and integrating AVM into MES," IEEE Trans. Semicond. Manuf., vol. 24, no. 2, pp. 261-272, May 2011.
16. M.-H. Hung, T.-H. Lin, F.-T. Cheng, and R.-C. Lin, "A novel virtual metrology scheme for predicting CVD thickness in semiconductor manufacturing," IEEE/ASME Trans. Mechatron., vol. 12, no. 3, pp. 308-316, Jun. 2007. (Pubitemid 47018782)
17. T.-H. Lin, F.-T. Cheng, W.-M. Wu, C.-A. Kao, A.-J. Ye, and F.-C. Chang, "NN-based key-variable selection method for enhancing virtual metrology accuracy," IEEE Trans. Semicond. Manuf., vol. 22, no. 1, pp. 204-211, Feb. 2009.
18. Y.-C. Su, T.-H. Lin, F.-T. Cheng, and W.-M. Wu, "Accuracy and real-time considerations for implementing various virtual metrology algorithms," IEEE Trans. Semicond. Manuf., vol. 21, no. 3, pp. 426-434, Aug. 2008.
19. W.-M. Wu, F.-T. Cheng, T. H. Lin, D.-L. Zeng, and J.-F. Chen, "Selection schemes of dual virtual-metrology outputs for enhancing prediction accuracy," IEEE Trans. Automat. Sci. Eng., vol. 8, no. 2, pp. 311-318, Apr. 2011.
20. J. Moyne, "PCS mechanisms for fab-wide development and latest trends, new directions in PCS: Virtual metrology," in Proc. ISMI AEC/APC Symp. XXI, Sep. 2009.
21. A. A. Khan, J. R. Moyne, and D. M. Tilbury, "On the quality of virtual metrology data for use in the feedback process control," in Proc. AEC/APC Symp. XIX, Sep. 2007.
22. A. A. Khan, J. R. Moyne, and D. M. Tilbury, "An approach for factorywide control utilizing virtual metrology," IEEE Trans. Semicond. Manuf., vol. 20, no. 4, pp. 364-375, Nov. 2007.
23. A. A. Khan, J. R. Moyne, and D. M. Tilbury, "Virtual metrology and feedback control for semiconductor manufacturing process using recursive partial least squares," J. Process Control, vol. 18, no. 10, pp. 961-974, Dec. 2008.
24. F.-T. Cheng, C.-A. Kao, and W.-M. Wu, "Advanced process control system and method utilizing virtual metrology with reliance index," U.S. Provisional Patent Pending under Applicat. 61/369 761, Aug. 2010.
25. W. A. Shewhart, Economic Control of Quality of Manufactured Product. New York: Van Nostrand, 1931.
26. J. W. Tukey, Exploratory Data Analysis. Reading, MA: Addison-Wesley, 1977.
27. R. E. Walpole, R. H. Myers, S. L. Myers, and K. Yee, Probability and Statistics for Engineers and Scientists, 7th ed. Englewood Cliffs, NJ: Prentice-Hall, 2002.
28. C.-T. Su and Y.-H. Hsiao, "An evaluation of the robustness of MTS for imbalanced data," IEEE Trans. Knowledge Data Eng., vol. 19, no. 10, pp. 321-332, Oct. 2007.
29. D. R. Anderson, D. J. Sweeney, T. A. Williams, and J.-C. Chen, Statistics for Business and Economics: A Practical Approach. Florence, KY: Thomson Learning, 2006.