Fault detection for a via etch process using adaptive multivariate methods

IEEE Transactions on Semiconductor Manufacturing

Volumn 18, Issue 4, 2005, Pages 528-533

  Spitzlsperger, Gerhard ^a,b   Schmidt, Carsten ^b   Ernst, Guenther ^b   Strasser, Hans ^b   Speil, Michaela ^b  

^a IEEE   (Germany)

^b RENESAS TECHNOLOGY CORP   (Japan)

Author keywords

Fault detection; Hotelling T 2; Knowledge based methods; Plasma etching

Indexed keywords

COVARIANCE MATRIX; FAULT DETECTION; KNOWLEDGE-BASED METHODS;

MATRIX ALGEBRA; MULTIVARIABLE CONTROL SYSTEMS; PLASMA ETCHING; SEMICONDUCTOR DEVICE MANUFACTURE;

PROCESS CONTROL;

EID: 28644433961     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/TSM.2005.858495     Document Type: Conference Paper

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