Benefit model of virtual metrology and integrating AVM into MES

IEEE Transactions on Semiconductor Manufacturing

Volumn 24, Issue 2, 2011, Pages 261-272

  Cheng, Fan Tien ^a   Chang, Jonathan Yung Cheng ^a   Huang, Hsien Cheng ^a   Kao, Chi An ^a,b   Chen, Ying Lin ^b   Peng, Ju Lei ^b  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

^b Foresight Technology Company Ltd   (Taiwan)

Author keywords

Automatic virtual metrology (AVM); manufacturing execution system (MES); run to run (R2R) control; wafer to wafer (W2W) control

Indexed keywords

AUTOMATIC VIRTUAL METROLOGY SYSTEMS; BUSINESS MODELS; CYCLE TIME; INTERNATIONAL SEMATECH MANUFACTURING INITIATIVES; INTERNATIONAL TECHNOLOGY; MANUFACTURING EXECUTION SYSTEM; MANUFACTURING PRACTICES; MANUFACTURING SYSTEM; OPERATION COST; PROCESS STABILITY; QUALITY INSPECTION SYSTEMS; ROAD-MAPS; RUN-TO-RUN; RUN-TO-RUN CONTROL; SEMICONDUCTOR INDUSTRY; SEMICONDUCTOR MANUFACTURING; VIRTUAL METROLOGY; WAFER-TO-WAFER (W2W) CONTROL;

INSPECTION; MAPS; PROCESS MONITORING; PROFITABILITY; ROADS AND STREETS; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON WAFERS; UNITS OF MEASUREMENT;

MANUFACTURE;

EID: 79955659976     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/TSM.2011.2104372     Document Type: Conference Paper

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