Nanogap electrode fabrication for a nanoscale device by volume-expanding electrochemical synthesis

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Volumn 7, Issue 15, 2011, Pages 2210-2216

  Kim, Ju Hyun ^a   Moon, Hanul ^a   Yoo, Seunghyup ^a   Choi, Yang Kyu ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

electrochemical deposition; feedback; nanogaps; organic thin film transistors; OTFT; platinum

Indexed keywords

ELECTROCHEMICAL DEPOSITION; ELECTROCHEMICAL SYNTHESIS; HIGH CRYSTALLINITY; HIGH RELIABILITY; LINE EDGE ROUGHNESS; LOW CRYSTALLINITY; MICRO GAPS; NANOGAP ELECTRODES; NANOGAP FABRICATION; NANOGAPS; NANOPATTERNING TECHNIQUES; NANOSCALE DEVICE; ORGANIC THIN-FILM TRANSISTORS; OTFT; PLATINUM IONS; SELF-LIMITED; VOLUME EXPANSION;

CHEMICAL SENSORS; ELECTRODEPOSITION; FABRICATION; GOLD DEPOSITS; PLATINUM; REDUCTION; RESISTORS; SEMICONDUCTING ORGANIC COMPOUNDS; THIN FILM TRANSISTORS;

ELECTROCHEMICAL ELECTRODES;

PLATINUM;

ARTICLE; CHEMISTRY; ELECTROCHEMISTRY; ELECTRODE; METHODOLOGY; SEMICONDUCTOR;

ELECTROCHEMISTRY; ELECTRODES; PLATINUM; TRANSISTORS, ELECTRONIC;

EID: 80051542669     PISSN: 16136810     EISSN: 16136829     Source Type: Journal    
DOI: 10.1002/smll.201002103     Document Type: Article

References (36)

1. T. Li, W. Hu, D. Zhu, Adv. Mater. 2010, 22, 286-300.
2. A. N. Broers, E. G. Lean, M. Hatzakis, Appl. Phys. Lett. 1969, 15, 98-101.
3. W. Chen, H. Ahmed, K. Nakazoto, Appl. Phys. Lett. 1995, 66, 3383-3384.
4. R. D. Piner, J. Zhu, F. Xu, S. H. Hong, C. A. Mirkin, Science 1999, 283, 661-663.
5. H. Zhang, S.-W. Chung, C. A. Mirkin, Nano Lett. 2003, 3, 43-45.
6. M. D. Fischbein, M. Drndic, Nano Lett. 2007, 7, 1329-1337.
7. H. Park, A. K. L. Lim, A. P. Alivisatos, J. Park, P. L. McEuen, Appl. Phys. Lett. 1999, 75, 301-303.
8. J. Park, A. N. Pasupathy, J. I. Goldsmith, C. Chang, Y. Yaish, J. R. Petta, M. Rinkoski, J. P. Sethna, H. D. Abruna, P. L. McEuen, D. C. Ralph, Nature 2002, 417, 722-725.
9. W. Liang, M. P. Shores, M. Bockrath, J. R. Long, H. Park, Nature 2002, 417, 725-729.
10. M. F. Lambert, M. F. Goffman, J. P. Bourgoin, P. Hesto, Nanotechnology 2003, 14, 772-777.
11. A. K. Mahapatro, S. Ghosh, D. B. Janes, IEEE Trans. Nanotechnol. 2006, 5, 232-236.
12. D. E. Johnston, D. R. Strachan, A. T. C. Johnson, Nano Lett. 2007, 7, 2774-2777.
13. M. Jung, W. Song, J. S. Lee, N. Kim, J. Kim, J. Park, H. Lee, K. Hirakawa, Nanotechnology 2008, 19, 495702.
14. A. Hatzor, P. S. Weiss, Science 2001, 291, 1019-1020.
15. M. E. Anderson, L. P. Tan, H. Tanaka, M. Mihok, H. Lee, M. W. Horn, P. S. Weiss, J. Vac. Sci. Technol. B 2003, 21, 3116-3119.
16. G. S. McCarty, Nano Lett. 2004, 4, 1391-1394.
17. C. S. Ah, Y. J. Yun, J. S. Lee, H. J. Park, D. H. Ha, W. S. Yun, Appl. Phys. Lett. 2006, 88, 133116.
18. L. Huang, L. Xu, H. Zhang, N. Gu, Chem. Comm. 2002, 1, 72-73.
19. D. L. Klein, P. L. McEuen, J. E. B. Katari, R. Roth, A. P. Alivisatos, Appl. Phys. Lett. 1996, 68, 2574-2576.
20. S. E. Kubatkin, A. V. Danilov, M. Hjort, J. Cornil, J.-L. Bredas, N. Stuhr-Hansen, P. Hedegard, T. Bjornholm, Nature 2003, 425, 698-701.
21. Y. Otsuka, Y. Naitoh, T. Matsumoto, W. Mizutani, H. Tabata, T. A. Kawai, Nanotechnology 2004, 15, 1639-1644.
22. T. Nagase, T. Kubota, S. Mashiko, Thin Solid Films 2003, 438, 374-377.
23. G. C. Gazzadi, E. Angeli, P. Facci, S. Frabboni, Appl. Phys. Lett. 2006, 89, 173112.
24. Y. Li, H.-Y. Lo, J. Phys. D: Appl. Phys. 2008, 41, 085301.
25. Y. V. Kervennic, H. S. J. Van Der Zant, A. F. Morpurgo, L. Gurevich, L. P. Kouwenhoven, Appl. Phys. Lett. 2002, 80, 321-323.
26. A. F. Morpurgo, C. M. Marcus, D. B. Robinson, Appl. Phys. Lett. 1999, 74, 2084-2086.
27. H. He, J. Zhu, N. J. Tao, L. A. Nagahara, I. Amlani, R. Tsui, J. Am. Chem. Soc. 2001, 123, 7730-7731.
28. S. Boussaad, N. J. Tao, Appl. Phys. Lett. 2002, 80, 2398-2400.
29. L. H. Yu, D. Natelson, Appl. Phys. Lett. 2003, 82, 2332-2334.
30. B. Liu, J. Xiang, J.-H. Tian, C. Zhong, B.-W. Mao, F.-Z. Yang, Z.-B. Chen, S.-T. Wu, Z.-Q. Tian, Electrochim. Acta 2005, 50, 3041-3047.
31. F. Chen, Q. Qing, L. Ren, Z. Wu, Z. Liu, Appl. Phys. Lett. 2005, 86, 123105.
32. J.-H. Tian, Y. Yang, B. Liu, B. Schollhorn, D.-Y. Wu, E. Maisonhaute, A. S. Muns, Y. Chen, C. Amatore, N.-J. Tao, Z.-Q. Tian, Nanotechnology 2010, 21, 274012.
33. M. D. Austin, S. Y. Chou, Appl. Phys. Lett. 2002, 81, 4431-4433.
34. L. Wang, D. Fine, T. Jung, D. Basu, H. von Seggern, A. Dodabalapur, Appl. Phys. Lett. 2004, 85, 1772-1774.
35. G. S. Tulevski, Q. Miao, A. Afzali, T. O. Graham, C. R. Kagan, C. Nuckolls, J. Am. Chem. Soc. 2006, 128, 1788-1789.
36. Y. Cao, S. Liu, Q. Shen, K. Yan, P. Li, J. Xu, D. Yu, M. L. Steigerwald, C. Nuckolls, Z. Liu, X. Guo, Adv. Funct. Mater. 2009, 19, 2743-2748.