SCOPUS 정보 검색 플랫폼 - 논문 보기

메뉴 건너뛰기

Journal of Photopolymer Science and Technology

Volumn 24, Issue 2, 2011, Pages 233-238

Quantitative pattern collapse metrology for 193nm immersion lithography

(6) Winroth, Gustaf a Gronheid, Roel a Lin, Chua b Neishi, Katsumi b Hamkawa, Ryota b Marcuccilli, Gino b

a IMEC (Belgium)

b KLA TENCOR CORPORATION (United States)

Author keywords

Defectivity; Immersion lithography; Pattern collapse

Indexed keywords

EID: 79961115885 PISSN: 09149244 EISSN: 13496336 Source Type: Journal
DOI: 10.2494/photopolymer.24.233 Document Type: Article

Times cited : (2)

References (15)

1
- 0001609218
- W.-D. Domke, V. L. Graffenberg, S. Patel, G. K. Rich, H. B. Cao, P. F. Nealey Proc. SPIE 3999(2000)313.
- (2000) Proc. SPIE , vol.3999 , pp. 313
- Domke, W.-D.¹ Graffenberg, V.L.² Patel, S.³ Rich, G.K.⁴ Cao, H.B.⁵ Nealey, P.F.⁶

2
- 0036030912
- S. Hien, G. K. Rich, G. Molina, H. B. Cao, P. F. Nealey Proc. SPIE 4690 (2002) 254.
- (2002) Proc. SPIE , vol.4690 , pp. 254
- Hien, S.¹ Rich, G.K.² Molina, G.³ Cao, H.B.⁴ Nealey, P.F.⁵

3
- 65849267969
- D. E. Noga, R. A. Lawson, C.-T. Lee, L. M. Tolbert, C. L. Henderson Proc. SPIE 7273 (2009)727334.
- (2009) Proc. SPIE , vol.7273 , pp. 727334
- Noga, D.E.¹ Lawson, R.A.² Lee, C.-T.³ Tolbert, L.M.⁴ Henderson, C.L.⁵

4
- 36449005681
- H. Namatsu, K. Kurihara, M. Nagase, K. Iwadate, K. Murase Appl. Phys. Lett. 66 (1995) 2655.
- (1995) Appl. Phys. Lett. , vol.66 , pp. 2655
- Namatsu, H.¹ Kurihara, K.² Nagase, M.³ Iwadate, K.⁴ Murase, K.⁵

5
- 0027625924
- T. Tanaka, M. Morigami, N. Atoda J. Electrochem. Soc. 140 (1993) LI 15.
- (1993) J. Electrochem. Soc. , vol.140
- Tanaka, T.¹ Morigami, M.² Atoda, N.³

6
- 34547880420
- J.-S. Kim, W. Chang, I. An, H.-K. Oh Jpn. J. Appl. Phys. 46 (2007) 5101.
- (2007) Jpn. J. Appl. Phys. , vol.46 , pp. 5101
- Kim, J.-S.¹ Chang, W.² An, I.³ Oh, H.-K.⁴

7
- 0027857033
- T. Tanaka, M. Morigami, N. Atoda Jpn. J. Appl. Phys. 32(1993)6059.
- (1993) Jpn. J. Appl. Phys , vol.32 , pp. 6059
- Tanaka, T.¹ Morigami, M.² Atoda, N.³

8
- 0141610864
- G. Lee, S.-K. Lee, Y.-S. Hwang, J.-C. Jung, C. Bok, S.-C. Moon, K.-S. Shin Proc. SPIE 5039 (2003)1416.
- (2003) Proc. SPIE , vol.5039 , pp. 1416
- Lee, G.¹ Lee, S.-K.² Hwang, Y.-S.³ Jung, J.-C.⁴ Bok, C.⁵ Moon, S.-C.⁶ Shin, K.-S.⁷

9
- 0141722561
- K. Tanaka, R. Naito, T. Kitada, Y. Kiba, Y. Yamada, M. Kobayashi, H. Ichikawa Proc. SPIE 5039 (2003) 1366.
- (2003) Proc. SPIE , vol.5039 , pp. 1366
- Tanaka, K.¹ Naito, R.² Kitada, T.³ Kiba, Y.⁴ Yamada, Y.⁵ Kobayashi, M.⁶ Ichikawa, H.⁷

10
- 78650104495
- R. Gronheid J. Vac. Sci. Tech. B 28 (2010) C6S1.
- (2010) J. Vac. Sci. Tech. B , vol.28
- Gronheid, R.¹

11
- 35148819284
- M. Sugiyama, M. Sanada, S. Wang, P. Wong, S. Sinkwitz, M. Jaramillo, G. Parris Proc. SPIE 6519(2007)651927.
- (2007) Proc. SPIE , vol.6519 , pp. 651927
- Sugiyama, M.¹ Sanada, M.² Wang, S.³ Wong, P.⁴ Sinkwitz, S.⁵ Jaramillo, M.⁶ Parris, G.⁷

12
- 0034318269
- D. L. Goldfarb, J. J. de Pablo, P. F. Nealey, J. P. Simons, W. M. Moreau, M. Angelopoulos J. Vac. Sci. Tech. B 18 (2000) 3313.
- (2000) J. Vac. Sci. Tech. B , vol.18 , pp. 3313
- Goldfarb, D.L.¹ de Pablo, J.J.² Nealey, P.F.³ Simons, J.P.⁴ Moreau, W.M.⁵ Angelopoulos, M.⁶

13
- 0034317289
- H. B. Cao, P. F. Nealey, W.-D. Domke J. Vac. Sci. Tech. B 18 (2000) 3303.
- (2000) J. Vac. Sci. Tech. B , vol.18 , pp. 3303
- Cao, H.B.¹ Nealey, P.F.² Domke, W.-D.³

14
- 24644431921
- J.-D. Chapon, C. Chaton, P. Gouraud, M. Broekaart, S. Warrick, I. Guilmeau, Y. Trouiller, J. Belledent Proc. SPIE 5753 (2005) 708.
- (2005) J. Belledent Proc. SPIE , vol.5753 , pp. 708
- Chapon, J.-D.¹ Chaton, C.² Gouraud, P.³ Broekaart, M.⁴ Warrick, S.⁵ Guilmeau, I.⁶ Trouiller, Y.⁷

15
- 78650085373
- W.-M. Yeh, D. E. Noga, R. A. Lawson, L. M. Tolbert, C. L. Henderson J. Vac. Sci. Tech. B 28(2010)C6S6.
- (2010) J. Vac. Sci. Tech. , vol.B28
- Yeh, W.-M.¹ Noga, D.E.² Lawson, R.A.³ Tolbert, L.M.⁴ Henderson, C.L.⁵

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.