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Journal of Vacuum Science and Technology B

Volumn 28, Issue 6, 2010, Pages

Impact of development chemistry on extreme ultraviolet resist performance

(1) Gronheid, Roel a

a IMEC (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIUM HYDROXIDE; CHEMICAL MODIFICATION; EXTREME ULTRAVIOLET LITHOGRAPHY;

AQUEOUS BASIS; CRITICAL DIMENSION; EXTREME ULTRAVIOLET; FAILURE MECHANISM; LINEWIDTH ROUGHNESS; PATTERN COLLAPSE; PERFORMANCE; SENSITIVITY PERFORMANCE; TETRABUTYL AMMONIUM HYDROXIDE; TETRAMETHYL AMMONIUM HYDROXIDE;

PHOTORESISTS;

EID: 78650104495 PISSN: 21662746 EISSN: 21662754 Source Type: Journal
DOI: 10.1116/1.3498751 Document Type: Article

Times cited : (14)

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