Influence of cyclic organosilicon precursors on the corrosion of aluminium coated sheet by atmospheric pressure dielectric barrier discharge

Surface and Coatings Technology

Volumn 205, Issue 23-24, 2011, Pages 5350-5357

  Boscher, Nicolas D ^a   Choquet, Patrick ^a   Duday, David ^a   Verdier, Stéphane ^b  

^a LUXEMBOURG INSTITUTE OF SCIENCE AND TECHNOLOGY   (Luxembourg)

^b Novelis Foil Innovation Centre   (Luxembourg)

Author keywords

Aluminium; AP DBD; Corrosion; Decamethylcyclopentasiloxane (DMCPS); Octamethylcyclotetrasiloxane (OMCTS)

Indexed keywords

ALUMINUM; ALUMINUM CORROSION; ATMOSPHERIC CHEMISTRY; ATMOSPHERIC CORROSION; ATMOSPHERIC PRESSURE; CORROSION; CORROSION PROTECTION; CROSSLINKING; DEPOSITION; DIELECTRIC DEVICES; DIELECTRIC MATERIALS; ELECTRIC DISCHARGES; FLOW CONTROL; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; NANOTRIBOLOGY; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY;

AP-DBD; ATMOSPHERIC PRESSURE DIELECTRIC BARRIER DISCHARGES; DECAMETHYLCYCLOPENTASILOXANE; DEPOSITION PARAMETERS; ELECTROCHEMICAL TECHNIQUES; HEXAMETHYL DISILOXANE; OCTAMETHYLCYCLOTETRASILOXANE; ORGANO-SILICON PRECURSOR;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 79960698621     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2011.05.043     Document Type: Article

References (36)

1. Morent R., De Geyter N., Van Vlierberghe S., Dubruel P., Leys C., Schacht E. Surf. Coat. Technol. 2009, 203:1366.
2. Fanelli F., Lovascio S., D'Agostino R., Arefi-Khonsari F., Fracassi F. Plasma Process. Polym. 2010, 7:535.
3. Boscher N.D., Choquet P., Duday D., Verdier S. Surf. Coat. Technol. 2010, 205:2438.
4. Boscher N.D., Choquet P., Duday D., Verdier S. Plasma Process. Polym. 2010, 7:163.
5. Massines F., Gherardi N., Fornelli A., Martin S. Surf. Coat. Technol. 2005, 200:1855.
6. Twomey B., Dowling D., Byrne G., O'Neill L., O'Hare L.-A. Plasma Process. Polym. 2007, 4:S450.
7. Simor M., Fiala A., Kovacik D., Hlidek P., Wypkema A., Kuipers R. Surf. Coat. Technol. 2007, 201:7802.
8. Hähnel M., Brüser V., Kersten H. Plasma Process. Polym. 2007, 4:629.
9. Paulussen S., Rego R., Goossens O., Vangeneugden D., Rose K. Surf. Coat. Technol. 2005, 200:672.
10. Ladwig A., Babayan S., Smith M., Hester M., Highland W., Koch R., Hicks R. Surf. Coat. Technol. 2007, 201:6460.
11. Yoshiki H., Abe K., Mitsui T. Thin Solid Films 2006, 515:1394.
12. Barchiche C.-E., Duday D., Choquet P., Migeon H.-N., Rocca E. Electrochim. Acta 2009, 54:5789.
13. O'Neill L., O'Hare L.-A., Leadley S.R., Goodwin A.J. Chem. Vap. Deposition 2005, 11:477.
14. Lee J.H., Kim Y.S., Oh J.S., Kyung S.J., Lim J.T., Yeom G.Y. J. Electrochem. Soc. 2009, 156:D248.
15. Kim M.C., Klages C.-P. Surf. Coat. Technol. 2009, 204:428.
16. Beck A.J., Short R.D., Matthews A. Surf. Coat. Technol. 2008, 203:822.
17. Goodwin A., Herbert T., Leadley S., Swallow F. Proceedings of the Eighth International Symposium on High Pressure, Low Temperature Plasma Chemistry, Hakone 8 2002, Pühajärve, Estonia.
18. Ward L.J., Schofield W.C.E., Badyal J.P.S., Goodwin A.J., Merlin P.J. Langmuir 2003, 19:2110.
19. Annual Book of ASTM Standards 1986, Copyright ASTM, PA, 19103pp.
20. Howells D.G., Henry B.M., Leterrier Y., Manson J.-A.E., Madocks J., Assender H.E. Surf. Coat. Technol. 2008, 202:3529.
21. Hoefnagels H.F., Wu D., de With G., Ming W. Langmuir 2007, 23:13158.
22. O'Hare L.A., Hynes A., Alexander M.R. Surf. Interface Anal. 2007, 39:926.
23. Alexander M.R., Short R.D., Jones F.R., Michaeli W., Blomfield C.J. Appl. Surf. Sci. 1999, 137:179.
24. Grill A., Neumayer D.A. J. Appl. Phys. 2003, 94:6697.
25. Supiot P., Vivien C., Granier A., Bousquet A., Mackova A., Escaich D., Clergereaux R., Raynaud P., Stryhal Z., Pavlik J. Plasma Process. Polym. 2006, 3:100.
26. Burkey D.D., Gleason K.K. J. Electrochem. Soc. 2001, 151:F105.
27. Zhu X.D., Arefi-Khonsari F., Petit-Etienne C., Tatoulian M. Plasma Process. Polym. 2005, 2:407.
28. Wang C.Y., Shen Z.X., Zheng J.Z. Appl. Spectrosc. 2001, 55:1347.
29. Grill A., Neumayer D.A. J. Appl. Phys. 2003, 94:6697.
30. Wang C.Y., Shen Z.X., Zheng J.Z. Appl. Spectrosc. 2000, 54:209.
31. Brevnov D.A., Rama Rao G.V., López G.P., Atanassov P.B. Electrochim. Acta 2004, 49:2487.
32. Zenasni A., Raynaud P., Sahli S., Rebiai S., Segui Y. Surf. Coat. Technol. 2003, 174:162.
33. Brasher D.M., Kingsbury A.H. J. Appl. Chem. 1954, 4:62.
34. Thiel J.A., Brace J.G., Knoll R.W. J. Vac. Sci. Technol. A 1994, 12:1365.
35. Qi Y., Xiao Z.G., Mantei T.D. J. Vac. Sci. Technol. A 2003, 21:1064.
36. Bousquet A., Bursikova V., Goullet A., Djouadi A., Zajickova L., Granier A. Surf. Coat. Technol. 2006, 200:6517.