One-step process to deposit a soft super-hydrophobic film by filamentary dielectric barrier discharge-assisted CVD using HMCTSO as a precursor

Surface and Coatings Technology

Volumn 204, Issue 4, 2009, Pages 428-432

  Kim, M C ^a   Klages, C P ^a  

^a TECHNICAL UNIVERSITY OF BRAUNSCHWEIG   (Germany)

Author keywords

Dielectric barrier discharge; Double rough structure; Super hydrophobic

Indexed keywords

AGING TESTS; AS-GROWN; DIELECTRIC BARRIER DISCHARGE; DIELECTRIC BARRIER DISCHARGES; DOUBLE ROUGH STRUCTURE; FILAMENTARY DIELECTRIC BARRIER DISCHARGES; LOTUS LEAF; ONE-STEP PROCESS; ROUGHNESS STRUCTURES; STRUCTURE OF FILMS; SUPER-HYDROPHOBIC; SUPER-HYDROPHOBIC SURFACES;

CHEMICAL VAPOR DEPOSITION; CONTACT ANGLE; DEPOSITS; DIELECTRIC DEVICES; FILM GROWTH; FLOW CONTROL; PLASMAS; SURFACE CHEMISTRY; TESTING;

HYDROPHOBICITY;

EID: 70249085214     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2009.08.002     Document Type: Article

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