Comparison of structure and mechanical properties of SiO2-like films deposited in O2/HMDSO pulsed and continuous plasmas

Surface and Coatings Technology

Volumn 200, Issue 22-23 SPEC. ISS., 2006, Pages 6517-6521

  Bousquet, A ^a   Bursikova, V ^b   Goullet, A ^a   Djouadi, A ^a   Zajickova, L ^b   Granier, A ^a  

^a INSTITUT DES MATÉRIAUX JEAN ROUXEL   (France)

^b MASARYK UNIVERSITY   (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

COMPRESSIVE STRESS; DELAMINATION; ELLIPSOMETRY; FRACTURE TOUGHNESS; INDENTATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PROTECTIVE COATINGS; THIN FILMS;

ELLIPSOMETRIC MEASUREMENTS; FISCHERSCOPE TESTER; HELICON REACTOR; NEWTON'S RING METHOD; PLASMA PULSING;

FUSED SILICA;

COMPRESSIVE STRESS; DELAMINATION; ELLIPSOMETRY; FRACTURE TOUGHNESS; FUSED SILICA; INDENTATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PROTECTIVE COATINGS; THIN FILMS;

EID: 33748138977     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.11.025     Document Type: Article

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