Dynamics and temperature dependence of etching processes of porous and barrier aluminum oxide layers

Electrochimica Acta

Volumn 49, Issue 15, 2004, Pages 2487-2494

  Brevnov, Dmitri A ^a   Rama Rao, G V ^a   López, Gabriel P ^a   Atanassov, Plamen B ^a  

^a University of New Mexico   (United States)

Author keywords

Anodic aluminum oxide; Barrier oxide layer; Impedance spectroscopy; Spectroscopic ellipsometry

Indexed keywords

ALUMINA; ANODIC OXIDATION; DISSOLUTION; ELECTROLYTES; ELLIPSOMETRY; ETCHING; PERMITTIVITY; PHASE INTERFACES; SPECTROSCOPIC ANALYSIS;

ANODIC ALUMINUM OXIDE; BARRIER OXIDE LAYER; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY (EIS); SPECTROSCOPIC ELLIPSOMETRY;

ELECTROCHEMISTRY;

EID: 1842662381     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2004.02.003     Document Type: Article

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