Ultra low-dielectric-constant methylated mesoporous silica films with high hydrophobicity and stability

Materials Chemistry and Physics

Volumn 129, Issue 3, 2011, Pages 1195-1200

  Yuan, Hao ^a,b   Xu, Jiaqiang ^a   Xie, Lili ^b  

^a SHANGHAI UNIVERSITY   (China)

^b SHANGHAI SECOND POLYTECHNIC UNIVERSITY   (China)

Author keywords

Mesoporous silica films; Methyl functionalization; Structural stability; Ultra low k materials

Indexed keywords

K-VALUES; MESOPOROUS SILICA FILM; METHYL GROUP; METHYL-FUNCTIONALIZATION; STRUCTURAL STABILITIES; STRUCTURAL STABILITY; TETRAETHYL ORTHOSILICATES; ULTRA LOW-K MATERIALS; VAPOR-PHASE TREATMENT; WIRE BONDING;

CALCINATION; CHEMICAL MECHANICAL POLISHING; DIELECTRIC MATERIALS; FUNCTIONAL GROUPS; HYDROPHOBICITY; MESOPOROUS MATERIALS; SEMICONDUCTING SILICON COMPOUNDS; SILICA; SILICON WAFERS; STRESSES; VAPORS;

STABILITY;

EID: 79960562683     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2011.06.006     Document Type: Article

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