Vapor infiltration techniques for spin-on mesoporous silica films

Thin Solid Films

Volumn 495, Issue 1-2, 2006, Pages 186-190

  Tanaka, Shunsuke ^a   Tada, Hiromi ^a   Maruo, Takanori ^a   Nishiyama, Norikazu ^a   Egashira, Yasuyuki ^a   Ueyama, Korekazu ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

Low k film; Mesoporous silica; Thin film; Vapor infiltration treatment

Indexed keywords

CATALYST ACTIVITY; HYDROCHLORIC ACID; INFILTRATION; NITRIC ACID; PERMITTIVITY; SILICA; SPIN COATING; SULFURIC ACID; SURFACE ACTIVE AGENTS;

HYDROTHERMAL STABILITY; LOW-K FILMS; MESOPOROUS SILICA; VAPOR INFILTRATION TREATMENT;

THIN FILMS;

EID: 28044444912     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.08.218     Document Type: Conference Paper

References (12)

1. L.W. Hrubesh, L.E. Keene, and V.R. Latorre J. Mater. Res. 8 1993 1736
2. L.W. Hrubesh J. Non-Cryst. Solids 225 1998 335
3. C.T. Kresge, M.E. Leonowicz, W.J. Roth, J.C. Vartuli, and J.S. Beck Nature 359 1992 710
4. J.S. Beck, J.C. Vartuli, W.J. Roth, M.E. Leonowicz, C.T. Kresge, K.D. Schmidtt, C.T.-W. Chu, D.H. Olson, E.W. Sheppard, S.B. McCullen, J.B. Higgins, and J.L. Schlenker J. Am. Chem. Soc. 114 1992 10834
5. M. Ogawa J. Chem. Soc., Chem. Commun. 1996 1149
6. D. Zhao, P. Yang, N. Melosh, J. Feng, B.F. Chmelka, and G.D. Stucky Adv. Mater. 10 1998 1380
7. S. Baskaran, J. Liu, K. Domansky, N. Kohler, X.H. Li, C. Coyle, G.E. Fryxell, S. Thevuthasan, and R.E. Williford Adv. Mater. 12 2000 291
8. X.S. Zhao, and G.Q. Lu J. Phys. Chem., B 102 1998 1556
9. V. Antochshuk, and M. Jaroniec Chem. Commun. 1999 2373
10. C.-M. Yang, A.T. Cho, F.M. Pan, T.G. Tsai, and K.J. Chao Adv. Mater. 13 2001 1099
11. S. Tanaka, J. Kaihara, N. Nishiyama, Y. Oku, Y. Egashira, and K. Ueyama Langmuir 20 2004 3780
12. P. Innocenzi, P. Falcaro, D. Grosso, and F. Babonneau J. Phys. Chem., B 107 2003 4711