SCOPUS 정보 검색 플랫폼

Advanced Materials

Volumn 13, Issue 14, 2001, Pages 1099-1102

Spin-on mesoporous silica films with ultralow dielectric constants, ordered pore structures, and hydrophobic surfaces

(5) Yang, C M a,b Cho, A T a Pan, F M a Tsai, T G a Chao, K J a

a NATIONAL TSING HUA UNIVERSITY (Taiwan)

b NATIONAL NANO DEVICE LABORATORIES (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL MECHANICAL POLISHING; COPOLYMERS; HYDROPHOBICITY; INTEGRATED CIRCUIT MANUFACTURE; MESOPOROUS MATERIALS; PERMITTIVITY; PORE SIZE; POROSITY; SCANNING ELECTRON MICROSCOPY; SURFACES; SYNTHESIS (CHEMICAL); THERMODYNAMIC STABILITY;

PLAUSIBLE MECHANISM; PORE STRUCTURES; SPIN ON MESOPOROUS SILICA FILMS; TRIBLOCK COPOLYMER;

SILICA;

EID: 0035908553 PISSN: 09359648 EISSN: None Source Type: Journal
DOI: 10.1002/1521-4095(200107)13:14<1099::AID-ADMA1099>3.0.CO;2-0 Document Type: Article

Times cited : (151)

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