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Volumn 3, Issue 7, 2011, Pages 2739-2742
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100 mm dynamic stencils pattern sub-micrometre structures
a
EPFL
(Switzerland)
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Author keywords
[No Author keywords available]
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Indexed keywords
APERTURE SIZES;
DEPOSITION SEQUENCES;
DYNAMIC MODES;
LIFE-TIMES;
MICROHEATER;
NOVEL SOLUTIONS;
STENCIL LITHOGRAPHY;
TWO-DIMENSIONAL PATTERNING;
TWO-DIMENSIONAL TRAJECTORY;
UNIQUE FEATURES;
VARIABLE PERIOD;
WAFER SCALE;
TWO DIMENSIONAL;
SILICON DERIVATIVE;
SILICON NITRIDE;
ARTICLE;
ATOMIC FORCE MICROSCOPY;
CHEMISTRY;
NANOTECHNOLOGY;
MICROSCOPY, ATOMIC FORCE;
NANOTECHNOLOGY;
SILICON COMPOUNDS;
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EID: 79960200730
PISSN: 20403364
EISSN: 20403372
Source Type: Journal
DOI: 10.1039/c1nr10083a Document Type: Article |
Times cited : (8)
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References (18)
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