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Volumn 184, Issue 7, 2011, Pages 384-390

Effective attenuation length dependence on photoelectron kinetic energy for Au from 1 keV to 15 keV

Author keywords

Effective attenuation length; Electron transport; HAXPES; Photoemission

Indexed keywords

BULK MATERIALS; BURIED INTERFACE; CHEMICAL CHARACTERIZATION; CORE LEVELS; DEPTH PROFILE; EFFECTIVE ATTENUATION LENGTH; ELECTRON KINETIC ENERGY; ELECTRON TRANSPORT; EXPERIMENTAL DATA; HARD X-RAY PHOTOELECTRON SPECTROSCOPY; HAXPES; INCIDENT PHOTON ENERGY; PHOTOELECTRON KINETIC ENERGY;

EID: 79959817731     PISSN: 03682048     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.elspec.2011.03.006     Document Type: Article
Times cited : (20)

References (40)
  • 1
    • 79959833526 scopus 로고    scopus 로고
    • note
    • The following definitions have been developed and published by the American Society for Testing and Materials (ASTM) Committee E-42 on Surface Analysis [2] and by the International Organization for Standardization (ISO) [3]: Inelastic Mean Free Path: the average of distances, measured along the trajectories, that particles with a given energy travel between inelastic collisions in a substance. Effective Attenuation Length: the average emission function decay length when the emission depth distribution function is sufficiently close to exponential for a given application. Average Emission Function Decay Length: the negative reciprocal slope of the logarithm of a specified exponential approximation to the emission depth distribution function over a specified range of depths, as determined by a straight-line fit to the emission depth distribution function plotted on a logarithmic scale versus depth on a linear scale. Emission Depth Distribution Function (for a measured signal): for particles or radiation emitted from a surface in a given direction, the probability that the particle or radiation leaving the surface in a specified state originated from a specified depth measured normally to the surface into the material.
  • 2
    • 0141987151 scopus 로고    scopus 로고
    • ASTM West Cdonshohocken, Pennsylvania p. 735
    • Standard E 673-98 Annual Book of ASTM Standards 2001 vol. 3.06 2001 ASTM West Cdonshohocken, Pennsylvania p. 735
    • (2001) Annual Book of ASTM Standards 2001 , vol.306
  • 3
    • 0003814221 scopus 로고    scopus 로고
    • International Organization for Standardization Geneva
    • ISO 18115 Surface Chemical Analysis-Vocabulary 2001 International Organization for Standardization Geneva
    • (2001) Surface Chemical Analysis-Vocabulary
  • 35
    • 0001634592 scopus 로고    scopus 로고
    • Free download as an extension of the XOP software, http://www.esrf.fr/ UsersAndScience/Experiments/TBS/SciSoft/xop2.3/download
    • D.L. Windt Comput. Phys. 12 1998 360 370 http://cletus.phys.columbia.edu/ windt/idl. Free download as an extension of the XOP software, http://www.esrf.fr/UsersAndScience/Experiments/TBS/SciSoft/xop2.3/download
    • (1998) Comput. Phys. , vol.12 , pp. 360-370
    • Windt, D.L.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.