Chemical functional polymers for direct UV assisted nanoimprinting of polymeric photonic microring resonators

Physica Status Solidi (A) Applications and Materials Science

Volumn 208, Issue 6, 2011, Pages 1308-1314

  Kirchner, Robert ^a   Kaiser, Marie Kathrin ^b   Adolphi, Barbara ^a   Landgraf, Rene ^a   Fischer, Wolf Joachim ^a  

^a DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

^b FRAUNHOFER INSTITUTE FOR PHOTONIC MICROSYSTEMS   (Germany)

Author keywords

biomolecule; functional resist; microring resonator; nanoimprint; optical micro cavity; residual layer

Indexed keywords

FUNCTIONAL RESIST; MICRORING RESONATOR; NANO-IMPRINT; OPTICAL MICROCAVITIES; RESIDUAL LAYERS;

ASPECT RATIO; ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; BIOMOLECULES; BIOSENSORS; FLUORINE; OPTICAL RESONATORS; PHOTOELECTRON SPECTROSCOPY; SURFACE ROUGHNESS; X RAY PHOTOELECTRON SPECTROSCOPY;

FUNCTIONAL POLYMERS;

EID: 79959254318     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.201000949     Document Type: Article

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