Study on optical intensity distribution in photocuring nanoimprint lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 6, 2003, Pages 2777-2782

  Hirai, Yoshihiko ^a   Kikuta, Hisao ^a   Sanou, Toshikazu ^a  

^a Osaka Prefecture University   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CURING; DIFFRACTION GRATINGS; ELECTROMAGNETIC WAVE DIFFRACTION; FINITE DIFFERENCE METHOD; IRRADIATION; LIGHT PROPAGATION; POLYMERS; QUARTZ; TIME DOMAIN ANALYSIS;

OPTICAL INTENSITY DISTRIBUTION; PHOTOPOLYMERS;

PHOTOLITHOGRAPHY;

EID: 0942267542     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1629717     Document Type: Conference Paper

References (6)

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