Development and validation of functional imprint material for the step and flash imprint lithography process

Microelectronic Engineering

Volumn 85, Issue 5-6, 2008, Pages 850-852

  Kettle, J ^a   Coppo, P ^b   Lalev, G ^a   Tattershall, C ^c   Dimov, S ^a   Turner, M L ^c  

^a CARDIFF UNIVERSITY   (United Kingdom)

^b BRUNEL UNIVERSITY   (United Kingdom)

^c UNIVERSITY OF MANCHESTER   (United Kingdom)

Author keywords

Lithography; Nanoimprint; NIL; Organic semiconductors; Phosphorescence; S FIL; Step and flash imprint lithography

Indexed keywords

FLUORESCENCE MICROSCOPY; NANOLITHOGRAPHY; PHOSPHORESCENCE; SEMICONDUCTING ORGANIC COMPOUNDS; SILICON WAFERS;

FLUORESCENT SIGNALS; LOW-COST FABRICATION; STEP-AND FLASH IMPRINT LITHOGRAPHY;

IRIDIUM COMPOUNDS;

LITHOGRAPHY; ORGANIC MATERIALS;

EID: 44149109194     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.12.070     Document Type: Article

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