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Volumn 20, Issue 34, 2009, Pages
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Ultrafast and selective reduction of sidewall roughness in silicon waveguides using self-perfection by liquefaction
a
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Author keywords
[No Author keywords available]
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Indexed keywords
DEFECT REPAIR;
LOW VISCOSITY;
MOLTEN LAYERS;
NOVEL TECHNIQUES;
ORDERS OF MAGNITUDE;
PULSE DURATIONS;
RESOLIDIFICATION;
SELECTIVE REDUCTION;
SI SURFACES;
SI-WAVEGUIDE;
SIDEWALL ROUGHNESS;
SILICON WAVEGUIDE;
SURFACE LAYERS;
ULTRA-FAST;
WAVEGUIDE TRANSMISSION LOSS;
XECL EXCIMER LASER;
EXCIMER LASERS;
GAS LASERS;
LIGHT;
LIGHT TRANSMISSION;
LIQUEFACTION;
NANOPHOTONICS;
OPTICAL WAVEGUIDES;
PHOTOMASKS;
PHOTONICS;
PULSED LASER APPLICATIONS;
SILICON;
SURFACE TENSION;
WAVEGUIDES;
SURFACES;
SILICON;
WATER;
XENON;
ARTICLE;
CALCULATION;
EXCIMER LASER;
EXPERIMENTAL STUDY;
LIGHT;
LIQUEFACTION;
MELTING POINT;
OPTICS;
PARAMETER;
PRIORITY JOURNAL;
ROUGHNESS;
SELF PERFECTION BY LIQUEFACTION;
SURFACE TENSION;
TIME;
VISCOSITY;
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EID: 70249112996
PISSN: 09574484
EISSN: 13616528
Source Type: Journal
DOI: 10.1088/0957-4484/20/34/345302 Document Type: Article |
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Times cited : (25)
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References (19)
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