Periodically structured metallic substrates for SERS

Sensors and Actuators, B: Chemical

Volumn 51, Issue 1-3, 1998, Pages 285-291

  Kahl, M ^a   Voges, Edgar ^a   Kostrewa, Stefan ^b   Viets, Carmen ^b   Hill, Wieland ^b  

^a TU DORTMUND UNIVERSITY   (Germany)

^b LEIBNIZ INSTITUT FÜR ANALYTISCHE WISSENSCHAFTEN ISAS E V   (Germany)

Author keywords

E beam lithography; Lift off technique; Periodical metallic substrates; Reactive ion etching; Surface enhanced Raman scattering (SERS)

Indexed keywords

DEPOSITION; ELECTRON BEAM LITHOGRAPHY; METALLIC FILMS; REACTIVE ION ETCHING; SURFACE ROUGHNESS;

LIFT OFF TECHNIQUES; PERIODICAL METALLIC SUBSTRATES; SURFACE ENHANCED RAMAN SCATTERING;

RAMAN SCATTERING;

EID: 0032130934     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-4005(98)00219-6     Document Type: Article

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