Micro-and nanopatterning of inorganic and polymeric substrates by indentation lithography

Nano Letters

Volumn 10, Issue 7, 2010, Pages 2702-2708

  Gong, Jinlong ^a   Lipomi, Darren J ^a   Deng, Jiangdong ^b   Nie, Zhihong ^a   Chen, Xin ^a   Randall, Nicholas X ^c   Nair, Rahul ^c   Whitesides, George M ^a  

^a HARVARD UNIVERSITY   (United States)

^b HARVARD UNIVERSITY   (United States)

^c CSM Instruments Inc   (United States)

Author keywords

Lithography; Nanofabrication; Nanoindentation; SERS; Surface patterning

Indexed keywords

APPLIED LOADS; CROSS SECTIONAL PROFILES; DIAMOND TIP; EVAPORATED FILMS; HARD MATERIAL; INDENTERS; LOADING FORCE; MULTIPLE LEVELS; NANOFABRICATION; NANOINDENTERS; NANOPATTERNING; PLANAR SUBSTRATE; POLYMERIC SUBSTRATE; SERS; SOFT LITHOGRAPHY; SURFACE PATTERNING; SURFACE-ENHANCED RAMAN SCATTERING;

ELECTRIC FIELDS; HARDNESS; LITHOGRAPHY; NANOINDENTATION; RAMAN SCATTERING; SILICON COMPOUNDS; SILICON OXIDES; SILVER; STRIPPING (DYES); SURFACES;

SUBSTRATES;

EID: 77955317159     PISSN: 15306984     EISSN: 15306992     Source Type: Journal    
DOI: 10.1021/nl101675s     Document Type: Article

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