Impact of epitaxial strain on the ferromagnetic transition temperature of SrRuO3 thin films

Thin Solid Films

Volumn 519, Issue 19, 2011, Pages 6264-6268

  Dirsyte, R ^a   Schwarzkopf, J ^a   Schmidbauer, M ^a   Wagner, G ^a   Irmscher, K ^a   Anooz, S Bin ^a,b   Fornari, R ^a  

^a LEIBNIZ INSTITUTE FOR CRYSTAL GROWTH   (Germany)

^b HADHRAMOUT UNIVERSITY   (Yemen)

Author keywords

Curie temperature; Epitaxial strain; Metal organic chemical vapor deposition; SrRuO3; Thin films

Indexed keywords

CHEMICAL VAPOUR DEPOSITION; COMPRESSIVE STRAIN; ELASTIC LATTICE STRAIN; EPITAXIAL STRAIN; FERROMAGNETIC PHASE TRANSITION; FERROMAGNETIC TRANSITION TEMPERATURES; HIGH RESOLUTION X RAY DIFFRACTION; IN-PLANE; METAL-ORGANIC; OUT-OF-PLANE LATTICE PARAMETERS; OXIDE SUBSTRATES; SRRUO3; SRTIO; TEMPERATURE-DEPENDENT RESISTIVITY;

CURIE TEMPERATURE; EPITAXIAL GROWTH; FERROMAGNETIC MATERIALS; FERROMAGNETISM; INDUSTRIAL CHEMICALS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; ORGANIC CHEMICALS; VAPOR DEPOSITION; X RAY DIFFRACTION;

EPITAXIAL FILMS;

EID: 79958220780     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.03.132     Document Type: Article

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