Metalorganic chemical vapor deposition of SrRuO3 thin film and its characterization

Journal of Materials Science

Volumn 38, Issue 12, 2003, Pages 2633-2638

  Lee, Hung Chih ^a   Tsai, Dah Shyang ^a  

^a NATIONAL YUNLIN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHEMICAL REACTORS; ELECTRIC CONDUCTIVITY; EVAPORATION; MICROSTRUCTURE; RUTHENIUM; STOICHIOMETRY; STRONTIUM COMPOUNDS; SURFACE ROUGHNESS; SYNTHESIS (CHEMICAL); THERMAL EFFECTS; THIN FILMS;

HOT-WALL TUBULAR REACTOR;

METALLORGANIC CHEMICAL VAPOR DEPOSITION;

EID: 0041805580     PISSN: 00222461     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1024482518470     Document Type: Article

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