Focused electron beam induced etching of titanium with XeF2

Nanotechnology

Volumn 22, Issue 26, 2011, Pages

  Schoenaker, F J ^a   Cordoba R ^a   Fernndez Pacheco, R ^a,b   Magen C ^a,c   Stephan O ^b   Zuriaga Monroy, C ^a   Ibarra, M R ^a   De Teresa, J M ^a  

^a UNIVERSITY OF ZARAGOZA   (Spain)

^b UNIVERSITÉ PARIS SUD   (France)

^c FUNDACIÓN ARAID   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

BEAM CURRENTS; BEAM ENERGIES; DWELL TIME; ETCH RATES; ETCHING MECHANISM; ETCHING PARAMETERS; ETCHING PROCESS; FOCUSED ELECTRON BEAMS; NANOPATTERNING; PATTERN SIZE; PIXEL SPACING; POTENTIAL APPLICATIONS;

BIOLOGICAL MATERIALS; ELECTRON BEAMS; MECHANICAL PROPERTIES; TITANIUM; TRANSMISSION ELECTRON MICROSCOPY;

ETCHING;

EID: 79957826211     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/22/26/265304     Document Type: Article

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