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Volumn 19, Issue 45, 2008, Pages
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Nanoscale electron beam induced etching: A continuum model that correlates the etch profile to the experimental parameters
a
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Author keywords
[No Author keywords available]
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Indexed keywords
ADSORPTION;
CONTINUUM MECHANICS;
DESORPTION;
DISSOCIATION;
ELECTRON BEAMS;
ELECTRON GUNS;
ETCHING;
EXPERIMENTS;
GAS ADSORPTION;
MASS TRANSFER;
NANOSTRUCTURED MATERIALS;
NANOTECHNOLOGY;
PARTICLE BEAMS;
CONTINUUM MODELS;
DEFOCUS;
ELECTRON BEAM INDUCED ETCHINGS;
ELECTRON FLUXES;
ETCH PRODUCTS;
ETCH PROFILES;
ETCHING PROFILES;
EXPERIMENTAL PARAMETERS;
INDUCED DEPOSITIONS;
MASS TRANSPORTS;
NANOSCALE ELECTRONS;
NANOSCALE ETCHINGS;
ELECTRONS;
ADSORPTION;
ADSORPTION KINETICS;
ARTICLE;
DESORPTION;
DIFFUSION;
DISSOCIATION;
ELECTRON;
ELECTRON BEAM;
ELECTRON TRANSPORT;
GAS;
MATHEMATICAL MODEL;
MOLECULAR INTERACTION;
MOLECULAR MECHANICS;
MOLECULAR MODEL;
MOLECULAR WEIGHT;
NANOTECHNOLOGY;
PRIORITY JOURNAL;
PROCESS MODEL;
PRODUCT DEVELOPMENT;
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EID: 58149269450
PISSN: 09574484
EISSN: 13616528
Source Type: Journal
DOI: 10.1088/0957-4484/19/45/455306 Document Type: Article |
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Times cited : (36)
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References (26)
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