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Thin Solid Films

Volumn 519, Issue 15, 2011, Pages 5178-5182

Improved properties of Ti-doped ZnO thin films by hydrogen plasma treatment

(3) Wang, F H a Chang, H P a Chao, J C a

a NATIONAL CHUNG HSING UNIVERSITY (Taiwan)

Author keywords

Hydrogen plasma; Sputter; Substrate temperature; Ti doped zinc oxide (TZO)

Indexed keywords

AS-DEPOSITED FILMS; FILM RESISTIVITY; HYDROGEN PLASMA TREATMENTS; HYDROGEN PLASMAS; MAGNETRON SPUTTER; OPTICAL CHARACTERISTICS; OXYGEN SPECIES; PREFERENTIAL ORIENTATION; RADIO FREQUENCIES; ROOM TEMPERATURE; SHALLOW DONORS; SPUTTER; SUBSTRATE TEMPERATURE; TI-DOPED ZINC OXIDE (TZO); ZNO THIN FILM;

CHEMICAL VAPOR DEPOSITION; DESORPTION; GRAIN BOUNDARIES; HYDROGEN; MAGNETRONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; THIN FILMS; VOLTAGE DIVIDERS; ZINC OXIDE;

PLASMA DEPOSITION;

EID: 79957655759 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2011.01.083 Document Type: Conference Paper

Times cited : (18)

References (29)

1
- 71649114632
- W. Dewald, V. Sittinger, W. Werner, C. Jacobs, and B. Szyszka Thin Solid Films 518 2009 1085
- (2009) Thin Solid Films , vol.518 , pp. 1085
- Dewald, W.¹ Sittinger, V.² Werner, W.³ Jacobs, C.⁴ Szyszka, B.⁵

2
- 67651229068
- I.E. Titkov, L.A. Delimova, A.S. Zubrilov, N.V. Seredova, I.A. Liniichuk, and I.V. Grekhov J. Mod. Opt. 56 2009 653
- (2009) J. Mod. Opt. , vol.56 , pp. 653
- Titkov, I.E.¹ Delimova, L.A.² Zubrilov, A.S.³ Seredova, N.V.⁴ Liniichuk, I.A.⁵ Grekhov, I.V.⁶

3
- 77949710003
- 101116 10.1063/1.3356221
- H.K. Liang, S.F. Yu, and H.Y. Yang Appl. Phys. Lett. 96 2010 101116 10.1063/1.3356221
- (2010) Appl. Phys. Lett. , vol.96 , pp. 101116
- Liang, H.K.¹ Yu, S.F.² Yang, H.Y.³

4
- 49349103082
- J.H. Bae, and H.K. Kim Thin Solid Films 516 2008 7866
- (2008) Thin Solid Films , vol.516 , pp. 7866
- Bae, J.H.¹ Kim, H.K.²

5
- 0021428475
- T. Minami, H. Nanto, and S. Takata Jpn. J. Appl. Phys. 23 1984 L280
- (1984) Jpn. J. Appl. Phys. , vol.23 , pp. 280
- Minami, T.¹ Nanto, H.² Takata, S.³

6
- 77956873362
- H.P. Chang, F.H. Wang, J.Y. Wu, C.Y. Kung, and H.W. Liu Thin Solid Films 518 2010 7445
- (2010) Thin Solid Films , vol.518 , pp. 7445
- Chang, H.P.¹ Wang, F.H.² Wu, J.Y.³ Kung, C.Y.⁴ Liu, H.W.⁵

7
- 0022146289
- T. Minami, H. Sato, H. Nanto, and S. Takata Jpn. J. Appl. Phys. 24 1985 L781
- (1985) Jpn. J. Appl. Phys. , vol.24 , pp. 781
- Minami, T.¹ Sato, H.² Nanto, H.³ Takata, S.⁴

8
- 77954740860
- H.Q. Le, S.K. Lim, G.K.L. Goh, S.J. Chua, and J.X. Ong J. Electrochem. Soc. 157 2010 H796
- (2010) J. Electrochem. Soc. , vol.157 , pp. 796
- Le, H.Q.¹ Lim, S.K.² Goh, G.K.L.³ Chua, S.J.⁴ Ong, J.X.⁵

9
- 70249099505
- L.P. Peng, L. Fang, X.F. Yang, H.B. Ruan, Y.J. Li, Q.L. Huang, and C.Y. Kong Phys. E 41 2009 1819
- (2009) Phys. e , vol.41 , pp. 1819
- Peng, L.P.¹ Fang, L.² Yang, X.F.³ Ruan, H.B.⁴ Li, Y.J.⁵ Huang, Q.L.⁶ Kong, C.Y.⁷

10
- 79952981478
- H.Q. Le, S.K. Lim, and G.K.L. Goh J. Cryst. Growth 312 2010 437
- (2010) J. Cryst. Growth , vol.312 , pp. 437
- Le, H.Q.¹ Lim, S.K.² Goh, G.K.L.³

11
- 56949089717
- J.L. Chung, J.C. Chen, and C.J. Tseng Appl. Surf. Sci. 255 2008 2494
- (2008) Appl. Surf. Sci. , vol.255 , pp. 2494
- Chung, J.L.¹ Chen, J.C.² Tseng, C.J.³

12
- 38949085924
- J.L. Chung, J.C. Chen, and C.J. Tseng Appl. Surf. Sci. 254 2008 2615
- (2008) Appl. Surf. Sci. , vol.254 , pp. 2615
- Chung, J.L.¹ Chen, J.C.² Tseng, C.J.³

13
- 1342281341
- Y.M. Lu, C.M. Chang, S.I. Tsai, and T.S. Wey Thin Solid Films 447-448 2004 56
- (2004) Thin Solid Films , vol.447-448 , pp. 56
- Lu, Y.M.¹ Chang, C.M.² Tsai, S.I.³ Wey, T.S.⁴

14
- 10644287533
- S.S. Lin, J.L. Huang, and D.F. Lii Mater. Chem. Phys. 90 2005 22
- (2005) Mater. Chem. Phys. , vol.90 , pp. 22
- Lin, S.S.¹ Huang, J.L.² Lii, D.F.³

15
- 70749091712
- K. Zheng, L. Gu, D. Sun, X.L. Mo, and G. Chen Mater. Sci. Eng., B 166 2009 104
- (2009) Mater. Sci. Eng., B , vol.166 , pp. 104
- Zheng, K.¹ Gu, L.² Sun, D.³ Mo, X.L.⁴ Chen, G.⁵

16
- 67651166610
- R.G.S. Pala, W. Tang, M.M. Sushchikh, J.N. Park, A.J. Forman, G. Wu, A. Kleiman-Shwarsctein, J. Zhang, E.W. McFarland, and H. Metiu J. Catal. 266 2009 50
- (2009) J. Catal. , vol.266 , pp. 50
- Pala, R.G.S.¹ Tang, W.² Sushchikh, M.M.³ Park, J.N.⁴ Forman, A.J.⁵ Wu, G.⁶ Kleiman-Shwarsctein, A.⁷ Zhang, J.⁸ McFarland, E.W.⁹ Metiu, H.¹⁰

17
- 70449491220
- C.Y. Tsay, H.C. Cheng, C.Y. Chen, K.J. Yang, and C.K. Lin Thin Solid Films 518 2009 1603
- (2009) Thin Solid Films , vol.518 , pp. 1603
- Tsay, C.Y.¹ Cheng, H.C.² Chen, C.Y.³ Yang, K.J.⁴ Lin, C.K.⁵

18
- 0242498431
- S.S. Lin, J.L. Huang, and D.F. Lii Surf. Coat. Technol. 176 2004 173
- (2004) Surf. Coat. Technol. , vol.176 , pp. 173
- Lin, S.S.¹ Huang, J.L.² Lii, D.F.³

19
- 0033534984
- K. Koski, J. Holsa, and P. Juliet Thin Solid Films 339 1999 240
- (1999) Thin Solid Films , vol.339 , pp. 240
- Koski, K.¹ Holsa, J.² Juliet, P.³

20
- 0025493712
- G. Sanon, R. Rup, and A. Mansingh Thin Solid Films 190 1990 287
- (1990) Thin Solid Films , vol.190 , pp. 287
- Sanon, G.¹ Rup, R.² Mansingh, A.³

21
- 24644458464
- G. Fang, D. Lia, and B.L. Yao Vacuum 68 2003 363
- (2003) Vacuum , vol.68 , pp. 363
- Fang, G.¹ Lia, D.² Yao, B.L.³

22
- 0001447933
- B.E. Sernelius, K.F. Berggren, Z.C. Jim, I. Hamberg, and C.G. Granqvist Phys. Rev. B 37 1988 10244
- (1988) Phys. Rev. B , vol.37 , pp. 10244
- Sernelius, B.E.¹ Berggren, K.F.² Jim, Z.C.³ Hamberg, I.⁴ Granqvist, C.G.⁵

23
- 22144438031
- B.Y. Oh, M.C. Jeong, D.S. Kim, W. Lee, and J.M. Myoung J. Cryst. Growth 281 2005 475
- (2005) J. Cryst. Growth , vol.281 , pp. 475
- Oh, B.Y.¹ Jeong, M.C.² Kim, D.S.³ Lee, W.⁴ Myoung, J.M.⁵

24
- 2342521249
- Y.M. Strzhemechny, H.L. Mosbacker, D.C. Look, D.C. Reynolds, C.W. Litton, N.Y. Garces, N.C. Giles, L.E. Halliburton, S. Niki, and L.J. Brillson Appl. Phys. Lett. 84 2004 2545
- (2004) Appl. Phys. Lett. , vol.84 , pp. 2545
- Strzhemechny, Y.M.¹ Mosbacker, H.L.² Look, D.C.³ Reynolds, D.C.⁴ Litton, C.W.⁵ Garces, N.Y.⁶ Giles, N.C.⁷ Halliburton, L.E.⁸ Niki, S.⁹ Brillson, L.J.¹⁰

25
- 1442360290
- E.G. Fu, D.M. Zhuang, G. Zhang, Z. Ming, W.F. Yang, and J.J. Liu Microelectron. J. 35 2004 383
- (2004) Microelectron. J. , vol.35 , pp. 383
- Fu, E.G.¹ Zhuang, D.M.² Zhang, G.³ Ming, Z.⁴ Yang, W.F.⁵ Liu, J.J.⁶

26
- 0035340773
- J.H. Shin, S.H. Shin, and J.I. Park J. Appl. Phys. 89 2001 5199
- (2001) J. Appl. Phys. , vol.89 , pp. 5199
- Shin, J.H.¹ Shin, S.H.² Park, J.I.³

27
- 34547669096
- N. Ohashi, Y.G. Wang, T. Ishigaki, Y. Wada, H. Taguchi, I. Sakaguchi, T. Ohgaki, Y. Adachi, and H. Haneda J. Cryst. Growth 306 2007 316
- (2007) J. Cryst. Growth , vol.306 , pp. 316
- Ohashi, N.¹ Wang, Y.G.² Ishigaki, T.³ Wada, Y.⁴ Taguchi, H.⁵ Sakaguchi, I.⁶ Ohgaki, T.⁷ Adachi, Y.⁸ Haneda, H.⁹

28
- 0032663894
- D.F. Paraguay, L.W. Estrada, N.D.R. Acosta, E. Andrade, and M. Miki-Yoshida Thin Solid Films 350 1999 192
- (1999) Thin Solid Films , vol.350 , pp. 192
- Paraguay, D.F.¹ Estrada, L.W.² Acosta, N.D.R.³ Andrade, E.⁴ Miki-Yoshida, M.⁵

29
- 10844264417
- R. Das, T. Jana, and S. Ray Sol. Energy Mater. Sol. Cells 86 2005 207
- (2005) Sol. Energy Mater. Sol. Cells , vol.86 , pp. 207
- Das, R.¹ Jana, T.² Ray, S.³

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