Characteristics of ZnO:In thin films prepared by RF magnetron sputtering

Physica E: Low-Dimensional Systems and Nanostructures

Volumn 41, Issue 10, 2009, Pages 1819-1823

  Peng, L P ^a   Fang, L ^a   Yang, X F ^a   Ruan, H B ^a,b   Li, Y J ^a   Huang, Q L ^a   Kong, C Y ^b  

^a CHONGQING UNIVERSITY   (China)

^b CHONGQING NORMAL UNIVERSITY   (China)

Author keywords

Optical and electrical properties; RF magnetron sputtering; ZnO:In thin films

Indexed keywords

CRYSTAL QUALITIES; CRYSTALLINITIES; DOPED ZNO; ELECTRICAL AND OPTICAL PROPERTIES; GLASS SUBSTRATES; GRAIN SIZE; HIGHER TEMPERATURES; OPTICAL AND ELECTRICAL PROPERTIES; RF MAGNETRON SPUTTERING; SUBSTRATE TEMPERATURE; TRANSPARENT CONDUCTIVE THIN FILMS; VISIBLE RANGE; ZNO; ZNO:IN THIN FILMS;

CONDUCTIVE FILMS; ELECTRIC PROPERTIES; MAGNETRON SPUTTERING; MAGNETRONS; OPTICAL PROPERTIES; SEMICONDUCTING ZINC COMPOUNDS; SUBSTRATES; TENSILE STRAIN; THERMAL EFFECTS; THIN FILMS; ZINC OXIDE;

OPTICAL FILMS;

EID: 70249099505     PISSN: 13869477     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physe.2009.07.006     Document Type: Article

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