Optimization of process parameters for sputtering of ceramic ZnO:Al2O3 targets for a-Si:H/μc-Si:H solar cells

Thin Solid Films

Volumn 518, Issue 4, 2009, Pages 1085-1090

  Dewald, W ^a   Sittinger, V ^a   Werner, W ^a   Jacobs, C ^a   Szyszka, B ^a  

^a FRAUNHOFER INSTITUTE FOR SURFACE ENGINEERING AND THIN FILMS IST   (Germany)

Author keywords

c Si:H; a Si:H; Ceramic magnetron sputtering; Front TCO; Static imprint; Target state; Thin film tandem solar cell; ZnO:Al

Indexed keywords

A-SI:H; ALUMINUM-DOPED ZNO; D.C. MAGNETRON SPUTTERING; ETCHING MORPHOLOGIES; OPTICAL AND ELECTRICAL PROPERTIES; OPTIMIZATION OF PROCESS PARAMETERS; OXYGEN PARTIAL PRESSURE; PROCESS PARAMETERS; RACE TRACKS; TARGET EROSION; TARGET STATE; THIN FILM TANDEMS; TOTAL PRESSURE; VISUAL ABSORPTIONS; ZNO;

ALUMINUM; CERAMIC MATERIALS; ELECTRIC PROPERTIES; ETCHING; MAGNETRONS; OPTICAL PROPERTIES; OXYGEN; SEMICONDUCTING ZINC COMPOUNDS; SILICON; SOLAR CELLS; THIN FILM DEVICES; THIN FILMS; ZINC OXIDE;

TARGETS;

EID: 71649114632     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.04.068     Document Type: Article

References (29)

1. Shah A.V., Vanecek M., Meier J., Meillaud F., Guillet J., Fischer D., Droz C., Niquille X., Fay S., Vallat-Sauvain E., Terrazzoni-Daudrix V., and Bailat J. J. Non-Cryst. Solids 338-340 (2004) 639
2. Müller J., Rech B., Springer J., and Vanecek M. Sol. Energy 77 (2004) 917
3. Kluth O., Rech B., Houben L., Wieder S., Schöpe G., Beneking C., Wagner H., Löffl A., and Schock H.W. Thin Solid Films 351 (1999) 247
4. Major S., Kumar S., Bhatnagar M., and Chopra K.L. Appl. Phys. Lett. 49 (1986) 394
5. Das R., Jana T., and Ray S. Sol. Energy Mater. Sol. Cells 86 (2005) 2007
6. Krc J., Smole F., and Topic M. Prog. Photovolt: Res. Appl. 11 (2003) 429
7. Krc J., Brecl K., Smole F., and Topic M. Sol. Energy Mater. Sol. Cells 90 (2006) 3339
8. Lundstedt T., Seifert E., Abramo L., thelin B., Nyström A., Pettersen J., and Bergman R. Chemometr. Intell. Lab. Syst. 42 (1998) 3
9. Pflug A., Sittinger V., Ruske F., Szyszka B., and Dittmar G. Thin Solid Films 455-456 (2004) 201
10. Leng J., Opsal J., Chu H., Senko M., and Aspnes D.E. Thin Solid Films 313-314 (1998) 132
11. Sernelius B.E. Phys. Rev., B 36 2 (1987) 1080
12. Herrmann D., Oertel M., Menner R., and Powalla M. Surf. Coat. Technol. 174-175 (2003) 229
13. Tominaga K., Chong M., and Shintani Y. J. Vac. Sci. Technol., A 12 4 (1994) 1435
14. Zhang X.B., Pei Z.L., Gong J., and Sun C. J. Appl. Phys. 101 (2007) 014910
15. Ellmer K. J. Phys. D: Appl. Phys. 33 (2000) R17
16. Mráz S., and Schneider J.M. J. Appl. Phys. 100 (2006) 023503
17. Zeuner M., Neumann H., Zalman J., and Biederman H. J. Appl. Phys. 83 (1998) 5083
18. Somekh R.E. J. Vac. Sci. Technol., A 2 (1984) 1285
19. Matsui H., Toyoda H., and Sugai H. J. Vac. Sci. Technol., A 23 (2005) 671
20. Rossnagel M. J. Vac. Sci. Technol. A7 (1989) 1025
21. Andritschky M., Guimardes F., and Teixeira V. Vacuum 44 (1993) 809
22. Tsuji T., and Hirohashi M. Appl. Surf. Sci. 157 (2000) 47
23. Hickernell F.S. Rev. Phys. Appl. 20 (1985) 319
24. Ruske F., Jacobs C., Sittinger V., Szyszka B., and Werner W. Thin Solid Films 515 (2007) 8695
25. Berginski M., Hüpkes J., Schulte M., Schöpe G., Stiebig H., Rech B., and Wuttig M. J. Appl. Phys. 101 (2007) 074903
26. M. Berginski, Dr. Thesis, p. 64, RWTH Aachen, Germany, 2007, URL: http://darwin.bth.rwth-aachen.de/opus3/volltexte/2008/2102/.
27. Szyszka B., Sittinger V., Jiang X., Hong R.J., Werner W., Pflug A., Ruske M., and Lopp A. Thin Solid Films 442 (2003) 179
28. Sittinger V., Ruske F., Werner W., Szyszka B., Rech B., Hüpkes J., Schöpe G., and Stiebig H. Thin Solid Films 496 (2006) 16
29. Calnan S., Hüpkes J., Rech B., Siekmann H., and Tiwari A.N. Thin Solid Films 516 (2008) 1242